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US5329733A Expired / Lapsed US ⏱️ 0.0 years remaining

Wafer slicing and grinding machine and a method of slicing and grinding wafers

Assignee: Silicon Technology Corp Japan
•
Filing: 1993-02-24
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Granted: 1994-07-19
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Expires: 2013-02-24
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Abstract

Abstract A wafer slicing and grinding machine is provided with a saw blade assembly for the slicing of wafers from an ingot. A grinding stage is also provided for sequentially grinding the rear face of a previously sliced wafer and the front face of an ingot in order to provide a double ground wafer. A transfer chuck and a holding chuck are disposed within the machine to perform movements for effecting a turning over of a wafer for grinding of the rear face of the wafer.

Inventors

  • 👤 Robert E. Steere, Jr.

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 02:10
CPC Classifications
B; B28; B28D; B28D5/00; B28D5/0058; B28D5/0082; B28D5/0094; B28D1/00; B28D1/003; B28D5/02; B28D5/022; B28D5/028

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 101 words
A method of slicing and grinding a wafer from an ingot comprising the steps of positioning an ingot in a slicing position; grinding a face of the ingot in said slicing position; slicing a wafer from the ground face of the ingot in said slicing position; moving the wafer sliced from the ingot to a holding station; thereafter transferring the wafer from said holding station to a position with an unground face thereof in a plane common to the face of the ingot; and thereafter grinding the unground face of the wafer and the face of the ingot in said plane.
Claim 2
Independent Claim 101 words
A method of slicing and grinding a wafer from an ingot comprising the steps of positioning an ingot in a slicing position; grinding a face of the ingot in said slicing position; slicing a wafer from the ground face of the ingot in said slicing position; moving the wafer sliced from the ingot to a holding station; thereafter transferring the wafer from said holding station to a position with an unground face thereof in a plane common to the face of the ingot; and thereafter grinding the unground face of the wafer and the face of the ingot in said plane.
Claim 3
Dependent Claim 45 words
A method as set forth in claim 1 which further comprises the steps of measuring the thickness of a ground wafer and adjusting the position of a subsequently positioned wafer relative to said plane in dependence on a measured thickness deviating from a present value.
Claim 4
Dependent Claim 25 words
A method as set forth in claim 1 which further comprises the steps of conveying the ground wafer from said plane to an unloading position.
Claim 5
Independent Claim 137 words
A method of slicing and grinding a wafer from an ingot comprising the steps of positioning an ingot on a longitudinal axis in a slicing position; grinding a face of the ingot in said slicing position; slicing a wafer from the ingot positioned at said slicing position after grinding of the face of the ingot; moving the wafer from the ingot positioned at said slicing position after grinding of the face of the ingot; moving the wafer sliced form the ingot at said slicing position to a holding station; moving a previously sliced wafer to a position with a second face thereof in a plane common to an unground face of the ingot in said slicing position; and thereafter grinding the second face of the previously sliced wafer and the face of the ingot in said plane.
Claim 6
Independent Claim 137 words
A method of slicing and grinding a wafer from an ingot comprising the steps of positioning an ingot on a longitudinal axis in a slicing position; grinding a face of the ingot in said slicing position; slicing a wafer from the ingot positioned at said slicing position after grinding of the face of the ingot; moving the wafer from the ingot positioned at said slicing position after grinding of the face of the ingot; moving the wafer sliced form the ingot at said slicing position to a holding station; moving a previously sliced wafer to a position with a second face thereof in a plane common to an unground face of the ingot in said slicing position; and thereafter grinding the second face of the previously sliced wafer and the face of the ingot in said plane.
Claim 7
Dependent Claim 27 words
A method as set forth in claim 4 wherein the face of the second wafer is ground sequentially before the face of the ingot in said plane.

References Cited (Backward Citations)

US3740900A Cited
US4420909A Cited
US4420909B1 Cited
US4420909B2 Cited
US4896459A Cited
JPS62264835A Cited
US4852304A Cited
US4881518A Cited
US4930262A Cited
US5025593A Cited
JPH029535A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-07-18 1998-01-17 1998-07-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-07-18 2002-01-17 2002-07-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-07-18 2006-01-17 2006-07-19 $7700.00 Window Closed / Lapsed

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