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US5331020A Expired / Lapsed US ⏱️ 0.0 years remaining

Organosilicon compounds and compositions containing them

Assignee: Dow Silicones UK Ltd
•
Filing: 1993-08-16
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Granted: 1994-07-19
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Expires: 2013-08-16
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Abstract

Abstract Organosilicon compounds with a siloxane portion and groups of the general formula --OR'OCH═CHR" (i) linked via an Si--O--C bond, wherein R' is a divalent hydrocarbon radical or a group --R°--(OR°) n --, wherein R° is alkylene and n is from 1 to 12, R" is H or alkyl are useful in radiation curable compositions, in which they are mixed with an initiator. The compositions are particularly useful in UV radiation curable relase coatings.

Inventors

  • 👤 Scott S. D. Brown
  • 👤 Peter C. Hupfield
  • 👤 Peter Y. K. Lo
  • 👤 Richard G. Taylor

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 03:27
CPC Classifications
C; C08; C08G; C08G77/00; C08G77/48; C08G77/50; C08G77/04; C08G77/20; C08G77/38; C08K; C08K5/00; C08K5/0091

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 112 words
A composition which will cure upon exposure to radiation comprising: (I) at least one organosilicon compound having a having a siloxane portion and at least one group of the general formula --OR'OCH═CHR" (i) linked to a silicon atom via an Si--O--C bond, wherein R' is selected from the group consisting of divalent hydrocarbon radicals having up to 8 carbon atoms and groups of the formula --R°--(OR°) n --, wherein R° denotes an alkylene group having up to 6 carbon atoms and n has a value of from 1 to 12, R" is selected from the group consisting of hydrogen and alkyl groups having up to 10 carbon atoms; and (II) an initiator.
Claim 2
Dependent Claim 112 words
A composition which will cure upon exposure to radiation comprising: (I) at least one organosilicon compound having a having a siloxane portion and at least one group of the general formula --OR'OCH═CHR" (i) linked to a silicon atom via an Si--O--C bond, wherein R' is selected from the group consisting of divalent hydrocarbon radicals having up to 8 carbon atoms and groups of the formula --R°--(OR°) n --, wherein R° denotes an alkylene group having up to 6 carbon atoms and n has a value of from 1 to 12, R" is selected from the group consisting of hydrogen and alkyl groups having up to 10 carbon atoms; and (II) an initiator.
Claim 3
Dependent Claim 20 words
A composition according to claim 11, characterised in that the radiation is UV radiation, and the initiator is a photoinitiator.
Claim 4
Dependent Claim 218 words
A composition according to claim 2 wherein the photoinitiator is selected from an onium salt selected from the group consisting of those with the general formulae Z 2 I + MX n - , Z 3 S + MX n - , Z 3 Se + MX n - , Z 4 P + MX n - and Z 4 N + MX n - where each Z independently denotes an organic group having from 1 to 30 carbon atoms and MX n - is a non-basic, non-nucleophilic anion or from a nitrobenzyl sulfonate esters of the general formula ##STR10## wherein A' is selected from the group consisting of alkyl groups, aryl groups, alkylaryl groups, halogen substituted alkyl groups, halogen substituted aryl groups, halogen substituted alkylaryl groups, nitro substituted aryl groups, nitro substituted alkylaryl group, aryl groups having halogen and nitro substituents, alkaryl groups having halogen and nitro substituents and the group --C 6 H 4 --C 6 H 4 --SO 3 --CHR'C 6 H 4-m Q m (NO 2 ), R' is selected from the group consisting of hydrogen, methyl and nitro substituted aryl, Q is selected from the group consisting of hydrocarbon groups, the group NO 2 and organosilicon compounds, provided Q is not an acidic group, m has a value of 0, 1 or 2.
Claim 5
Dependent Claim 46 words
A composition according to claim 3, wherein the non-basic, non-nucleophilic anion is selected from the group consisting of BF 4 - , PF 6 - , AsF 6 - , SbF 6 - , SbCl 6 - , HSO 4 - and ClO 4 - .
Claim 6
Dependent Claim 256 words
A composition which will cure upon exposure to radiation which comprises: (I) at least one organosilicon compound having at least two organosilicon units, at least one of which has the general formula ##EQU8## any other organosilicon units, if present in the organosilicon compound, having the general formula ##EQU9## wherein R' is selected from the group consisting of divalent hydrocarbon radicals having up to 8 carbon atoms and groups of the formula --R°--(OR°) n --, wherein R° denotes an alkylene group having up to 6 carbon atoms and n has a value of from 1 to 12, R" is selected from the group consisting of hydrogen and alkyl groups having up to 10 carbon atoms, R is selected from the group consisting of monovalent hydrocarbon groups having up to 18 carbon atoms and substituted hydrocarbon groups having up to 18 carbon atoms, X is a hydrocarbonoxy group having up to 8 carbon atoms, Y is a group having the formula ##EQU10## wherein R' links the silicon atom of unit (ii) to the silicon atom of the group Y, a has a value of from 1 to 4, b and b' have a value of from 0 to 3, c has a value of 0 or 1, d has a value of from 0 to 2, a+b+c+d having a value of from 1 to 4, provided at least one of 4-a-b-c-d in (ii) and 3-b' in Y is not zero, the oxygen atoms, where present in ##EQU11## linking silicon atoms to form siloxane bonds; and (II) an initiator.
Claim 7
Dependent Claim 256 words
A composition which will cure upon exposure to radiation which comprises: (I) at least one organosilicon compound having at least two organosilicon units, at least one of which has the general formula ##EQU8## any other organosilicon units, if present in the organosilicon compound, having the general formula ##EQU9## wherein R' is selected from the group consisting of divalent hydrocarbon radicals having up to 8 carbon atoms and groups of the formula --R°--(OR°) n --, wherein R° denotes an alkylene group having up to 6 carbon atoms and n has a value of from 1 to 12, R" is selected from the group consisting of hydrogen and alkyl groups having up to 10 carbon atoms, R is selected from the group consisting of monovalent hydrocarbon groups having up to 18 carbon atoms and substituted hydrocarbon groups having up to 18 carbon atoms, X is a hydrocarbonoxy group having up to 8 carbon atoms, Y is a group having the formula ##EQU10## wherein R' links the silicon atom of unit (ii) to the silicon atom of the group Y, a has a value of from 1 to 4, b and b' have a value of from 0 to 3, c has a value of 0 or 1, d has a value of from 0 to 2, a+b+c+d having a value of from 1 to 4, provided at least one of 4-a-b-c-d in (ii) and 3-b' in Y is not zero, the oxygen atoms, where present in ##EQU11## linking silicon atoms to form siloxane bonds; and (II) an initiator.
Claim 8
Dependent Claim 18 words
A composition according to claim 5, wherein the radiation is UV radiation, and the initiator is a photoinitiator.
Claim 9
Dependent Claim 217 words
A composition according to claim 6 wherein the photoinitiator is selected from an onium salt selected from the group consisting those with the general formulae Z 2 I + MX n - , Z 3 S + MX n - , Z 3 Se + MX n - , Z 4 P + MX n - and Z 4 N + MX n - where each Z independently denotes an organic group having from 1 to 30 carbon atoms and MX n - is a non-basic, non-nucleophilic anion or from a nitrobenzyl sulfonate esters of the general formula ##STR11## wherein A' is selected from the group consisting of alkyl groups, aryl groups, alkylaryl groups, halogen substituted alkyl groups, halogen substituted aryl groups, halogen substituted alkylaryl groups, nitro substituted aryl groups, nitro substituted alkylaryl group, aryl groups having halogen and nitro substituents, alkaryl groups having halogen and nitro substituents and the group --C 6 H 4 --C 6 H 4 --SO 3 --CHR'C 6 H 4-m Q m (NO 2 ), R' is selected from the group consisting of hydrogen, methyl and nitro substituted aryl, Q is selected from the group consisting of hydrocarbon groups, the group NO 2 and organosilicon compounds, provided Q is not an acidic group, m has a value of 0, 1 or 2.
Claim 10
Dependent Claim 46 words
A composition according to claim 7 wherein the non-basic, non-nucleophilic anion is selected from the group consisting of BF 4 - , PF 6 - , AsF 6 - , SbF 6 - , SbCl 6 - , HSO 4 - and ClO 4 - .
Claim 11
Independent Claim 274 words
A method of treating a solid substrate with an organosilicon composition, which comprises: (A) coating said substrate with a composition comprising: (I) at least one organosilicon compound having at least two organosilicon units, at least one of which has the general formula ##EQU12## any other organosilicon units, if present in the organosilicon compound, having the general formula ##EQU13## wherein R' is selected from the group consisting of divalent hydrocarbon radicals having up to 8 carbon atoms and groups of the formula --R°--(OR°) n --, wherein R° denotes an alkylene group having up to 6 carbon atoms and n has a value of from 1 to 12, R" is selected from the group consisting of hydrogen and alkyl groups having up to 10 carbon atoms, R is selected from the group consisting of monovalent hydrocarbon groups having up to 18 carbon atoms and substituted hydrocarbon groups having up to 18 carbon atoms, X is a hydrocarbonoxy group having up to 8 carbon atoms, Y is a group having the formula ##EQU14## wherein R' links the silicon atom of unit (ii) to the silicon atom of the group Y, a has a value of from 1 to 4, b and b' have a value of from 0 to 3, c has a value of 0 or 1, d has a value of from 0 to 2, a+b+c+d having a value of from 1 to 4, provided at least one of 4-a-b-c-d in (ii) and 3-b' in Y is not zero, the oxygen atoms, where present in ##EQU15## linking silicon atoms to form siloxane bonds; and (II) an initiator; and (B) exposing said coated substrate to radiation.
Claim 12
Independent Claim 274 words
A method of treating a solid substrate with an organosilicon composition, which comprises: (A) coating said substrate with a composition comprising: (I) at least one organosilicon compound having at least two organosilicon units, at least one of which has the general formula ##EQU12## any other organosilicon units, if present in the organosilicon compound, having the general formula ##EQU13## wherein R' is selected from the group consisting of divalent hydrocarbon radicals having up to 8 carbon atoms and groups of the formula --R°--(OR°) n --, wherein R° denotes an alkylene group having up to 6 carbon atoms and n has a value of from 1 to 12, R" is selected from the group consisting of hydrogen and alkyl groups having up to 10 carbon atoms, R is selected from the group consisting of monovalent hydrocarbon groups having up to 18 carbon atoms and substituted hydrocarbon groups having up to 18 carbon atoms, X is a hydrocarbonoxy group having up to 8 carbon atoms, Y is a group having the formula ##EQU14## wherein R' links the silicon atom of unit (ii) to the silicon atom of the group Y, a has a value of from 1 to 4, b and b' have a value of from 0 to 3, c has a value of 0 or 1, d has a value of from 0 to 2, a+b+c+d having a value of from 1 to 4, provided at least one of 4-a-b-c-d in (ii) and 3-b' in Y is not zero, the oxygen atoms, where present in ##EQU15## linking silicon atoms to form siloxane bonds; and (II) an initiator; and (B) exposing said coated substrate to radiation.
Claim 13
Dependent Claim 23 words
A method according to claim 9 wherein said radiation is ultraviolet radiation and wherein said substrate is a cellulosic, polyester or polyethylene substrate.
Claim 14
Dependent Claim 15 words
A solid substrate coated with an organosilicon composition according to the method of claim 9.

References Cited (Backward Citations)

US4311821A Cited
EP0058909A1 Cited
US4801725A Cited
US5145901A Cited
US5166295A Cited
US5231157A Cited
EP0462389A2 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-07-18 1998-01-17 1998-07-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-07-18 2002-01-17 2002-07-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-07-18 2006-01-17 2006-07-19 $7700.00 Window Closed / Lapsed

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