Patent US5399231A successfully refreshed from Google Patents.
US5399231A
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Method of forming crystalline silicon devices on glass
Assignee: University of California
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Filing: 1993-10-18
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Granted: 1995-03-21
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Expires: 2013-10-18
Abstract
Abstract A method for fabricating single-crystal silicon microelectronic components on a silicon substrate and transferring same to a glass substrate. This is achieved by utilizing conventional silicon processing techniques for fabricating components of electronic circuits and devices on bulk silicon, wherein a bulk silicon surface is prepared with epitaxial layers prior to the conventional processing. The silicon substrate is bonded to a glass substrate and the bulk silicon is removed leaving the components intact on the glass substrate surface. Subsequent standard processing completes the device and circuit manufacturing. This invention is useful in applications requiring a transparent or insulating substrate, particularly for display manufacturing. Other applications include sensors, actuators, optoelectronics, radiation hard electronics, and high temperature electronics.
Inventors
- 👤 Anthony M. McCarthy
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 19:01
CPC Classifications
H; H10; H10P; H10P90/00; H10P90/19; H10P90/1904; H10P90/1906; H10P90/1914; G; G02; G02F; G02F1/00; G02F1/01; G02F1/13; G02F1/133; G02F1/1333; G02F1/1345; G02F1/13454; H10D; H10D86/00; H10D86/01; H10D86/021; H10D86/0214; H10D86/40; H10D86/60; Y; Y10; Y10S; Y10S148/00; Y10S148/035
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
48 words
A method for forming silicon devices on glass comprising: forming at least a layer of silicon on a silicon substrate; introducing at least one region with a dopant species in the layer of silicon; bonding the layer of silicon to a glass substrate; and removing the silicon substrate.
Claim 2
Independent Claim
48 words
A method for forming silicon devices on glass comprising: forming at least a layer of silicon on a silicon substrate; introducing at least one region with a dopant species in the layer of silicon; bonding the layer of silicon to a glass substrate; and removing the silicon substrate.
Claim 3
Dependent Claim
24 words
The method of claim 1, additionally including forming an etch stop layer on the silicon substrate prior to forming the layer of silicon thereon.
Claim 4
Dependent Claim
31 words
The method of claim 1, additionally including forming at least a dielectric layer on the glass substrate or silicon layer prior to bonding the layer of silicon to the glass substrate.
Claim 5
Dependent Claim
28 words
The method of claim 1, additionally including forming at least one spacer on the layer of silicon prior to bonding the layer of silicon to the glass substrate.
Claim 6
Dependent Claim
29 words
The method of claim 4, additionally including implementation of metallization of the surface of the layer of silicon prior to bonding the layer of silicon to the glass substrate.
Claim 7
Dependent Claim
28 words
The method of claim 1, additionally including smoothing the surface of the layer of silicon by directing laser energy thereon causing melting, and allowing the surface to recrystallize.
Claim 8
Dependent Claim
23 words
The method of claim 1, wherein removing of the silicon substrate is carried out by a polishing technique followed by an etching technique.
Claim 9
Dependent Claim
13 words
The method of claim 1, wherein the layer of silicon is epitaxially formed.
Claim 10
Dependent Claim
28 words
The method of claim 1, wherein the at least one region formed in the layer of silicon is formed by implantation of a dopant species and activation thereof.
Claim 11
Dependent Claim
41 words
The method of claim 1, additionally including forming an etch stop layer on the silicon substrate prior to forming the silicon layer by implantation, epitaxy or liquid source doping, and then forming the layer of silicon on the etch stop layer.
Claim 12
Dependent Claim
17 words
The method of claim 10, additionally removing the etch stop layer following removal of the silicon substrate.
Claim 13
Dependent Claim
15 words
The method of claim 11, wherein the etch stop layer is removed by plasma etching.
Claim 14
Dependent Claim
33 words
The method of claim 1, additionally including forming a plurality of etch stop and silicon layers, with a first of the etch stop layers being formed on a surface of the silicon substrate.
Claim 15
Dependent Claim
32 words
A crystalline silicon device on glass, formed by the method of claim 1, wherein the glass is of a type incapable of withstanding silicon layer processing temperatures of over about 600° C.
Claim 16
Dependent Claim
40 words
In a process for producing crystalline silicon microelectronic components on a glass substrate, the improvement comprising: forming the crystalline silicon microelectronic components on a silicon substrate; transferring the thus formed components to a glass substrate; and removing the silicon substrate.
Claim 17
Dependent Claim
40 words
In a process for producing crystalline silicon microelectronic components on a glass substrate, the improvement comprising: forming the crystalline silicon microelectronic components on a silicon substrate; transferring the thus formed components to a glass substrate; and removing the silicon substrate.
Claim 18
Dependent Claim
51 words
The improvement of claim 15, wherein the crystalline silicon microelectronic components are formed on the silicon substrate by: providing at least one etch stop on a surface of the silicon substrate; forming at least one silicon layer on the etch stop layer; and forming the microelectronic components in the silicon layer.
Claim 19
Dependent Claim
25 words
The improvement of claim 16, wherein transferring the components to a glass substrate is carried out by bonding the silicon layer to a glass substrate.
Claim 20
Dependent Claim
36 words
The improvement of claim 17, wherein removing the silicon substrate is carried out by a process selected from the group of polishing, dry etching, wet etching, and a combination of polishing and dry or wet etching.
Claim 21
Dependent Claim
64 words
The improvement of claim 16, additionally including: depositing a low temperature oxide layer on the silicon layer; patterning and etching the oxide and silicon layers to form silicon islands; depositing a second low temperature oxide layer on exposed edges of the silicon islands; forming a contact pattern through the oxide layers with the components; and forming a patterned metal layer on the oxide layer.
Claim 22
Dependent Claim
65 words
The improvement of claim 16, additionally including: forming an oxide layer on the surface of the silicon layer and the microelectronic components; forming contact regions in the oxide layer; forming spacers of conductive material over the oxide layer; forming contacts intermediate the patterned metal layer and the microelectronic components; and forming a patterned metal layer over sections of the oxide layer and intermediate the spacers.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-03-20 | 1998-09-19 | 1999-03-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-03-20 | 2002-09-19 | 2003-03-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-03-20 | 2006-09-19 | 2007-03-21 | $7700.00 | Window Closed / Lapsed |