Semiconductor memory device including stabilizing capacitive elements each having a MOS capacitor structure

Claim 2

A semiconductor device including an internal circuit having an insulated gate type field effect transistor, comprising: a charge pump capacitive element having one electrode coupled to receive a clock signal, and another electrode; a first diode element connected between the other electrode of said charge pump capacitive element and a first power supply node receiving a first power source voltage; a second diode element connected between the other electrode of said capacitive element and an output node; and voltage generation circuitry including a plurality of stabilizing capacitive elements connected in series between said output node and a second node receiving a predetermined reference potential, for generating a potential greater in absolute value than the first power source voltage onto the output node; wherein each of said plurality of stabilizing capacitive elements is formed by an insulated gate type field effect transistor having a gate insulating film identical in thickness to that of the insulated gate type field effect transistor of said internal circuit.

Claim 3

The semiconductor device according to claim 1, wherein said predetermined potential is a ground potential, and said first power source voltage is a power supply voltage higher than said ground potential.

Claim 4

The semiconductor device according to claim 1, wherein said internal circuit comprises: a memory cell array including a plurality of memory cells arranged in a matrix of rows and columns, each of the memory cells including an insulated gate type field effect transistor having a first gate insulating film thickness; a plurality of word lines provided corresponding to the respective rows of memory cells, each of the word lines connecting memory cells of a corresponding row; word line selecting means responsive to an address signal for generating a word line selecting signal to select a word line out of said plurality of word lines, the word line selecting means including an insulated gate type field effect transistor having a second gate insulating film thickness, and word line driving means responsive to the word line selecting signal for transmitting the potential generated by said voltage generation circuitry onto a word line selected by the word line selecting signal, the word line driving means including an insulated gate type field effect transistor having a third gate insulating film thickness, and the thickness of the gate insulating film of each of said plurality of stabilizing capacitive elements is equal to either the first or second gate insulating film thickness.

Claim 5

The semiconductor device according to claim 1, further comprising a voltage-down converter for down-converting an externally applied power supply voltage to generate said power source potential.

Claim 6

The semiconductor device according to claim 3, wherein the thickness of the gate insulating film is at most 100 Å.

Claim 7

A semiconductor device including an internal circuit having an insulated gate type effect transistor, comprising: a charge pump capacitive element having one electrode coupled to receive a clock signal, and another electrode; a first diode element connected between the other electrode of said charge pump capacitive element and a first power supply node receiving a first power source voltage; a second diode element connected between the other electrode of said capacitive element and an output node; and voltage generation circuitry including a plurality of stabilizing capacitive elements connected in series between said output node and a second node receiving a predetermined reference potential, for generating a potential greater in absolute value than the first power source voltage onto the output node; wherein each of said plurality of stabilizing capacitive elements is formed by an insulated gate type field effect transistor having a gate insulating film identical in thickness to that of the insulated gate type field effect transistor of said internal circuit, said internal circuit comprises a memory cell array including a plurality of memory cells arranged in a matrix of rows and columns, each of the memory cells including an insulated gate type field effect transistor having a first gate insulating film thickness, and the thickness of the gate insulating film of each of said plurality of stabilizing capacitive elements is equal to the first gate insulating film thickness.

Claim 8

A semiconductor device including an internal circuit having an insulated gate type effect transistor, comprising: a charge pump capacitive element having one electrode coupled to receive a clock signal, and another electrode; a first diode element connected between the other electrode of said charge pump capacitive element and a first power supply node receiving a first power source voltage; a second diode element connected between the other electrode of said capacitive element and an output node; and voltage generation circuitry including a plurality of stabilizing capacitive elements connected in series between said output node and a second node receiving a predetermined reference potential, for generating a potential greater in absolute value than the first power source voltage onto the output node; wherein each of said plurality of stabilizing capacitive elements is formed by an insulated gate type field effect transistor having a gate insulating film identical in thickness to that of the insulated gate type field effect transistor of said internal circuit, said internal circuit comprises a memory cell array including a plurality of memory cells arranged in a matrix of rows and columns, each of the memory cells including an insulated gate type field effect transistor having a first gate insulating film thickness, and the thickness of the gate insulating film of each of said plurality of stabilizing capacitive elements is equal to the first gate insulating film thickness.