Efficient chemistry for selective modification and metallization of substrates

Claim 2

A process for modifying a substrate, comprising the steps of: a) providing a substrate having benzyl halide or benzyl pseudohalide groups on at least a portion of the substrate, and b) contacting the benzyl halide or benzyl pseudohalide functionalized substrate with a nucleophilic reagent with the general formula N-R, wherein N is a nucleophilic group and R is a group capable of imparting to the substrate a selected functionality, wherein, prior to said step of contacting said substrate with said nucleophilic reagent, at least a portion of said substrate is exposed to sufficient actinic radiation to liberate a selected amount of halide or pseudohalide from said benzyl halide or said benzyl pseudohalide groups, to modify the reactivity of said substrate to said nucleophilic reagent, wherein said amount of actinic radiation is not more than about 100 mJ/cm 2 .

Claim 3

The process of claim 1, wherein said actinic radiation is visible light, ultraviolet light, X-rays, γ-rays, electron beams, or ion beams.

Claim 4

The process of claim 1, wherein the dose of said actinic radiation is less than a dose of actinic radiation sufficient to convert essentially all of said benzyl halide or benzyl pseudohalide groups on said surface to their photoproducts.

Claim 5

The process of claim 1, wherein said actinic radiation is patterned.

Claim 6

A process for modifying a substrate, comprising the steps of: a) providing a substrate having benzyl halide or benzyl pseudohalide groups on at least a portion of the substrate, and b) contacting the benzyl halide or benzyl pseudohalide functionalized substrate with a nucleophilic reagent with the general formula N-R, wherein N is a nucleophilic group and R is a group capable of imparting to the substrate a selected functionality, wherein said functional group R comprises a ligating moiety that is capable of binding an electroless metallization catalyst, c) contacting the ligand-modified substrate with an electroless metallization catalyst, and d) contacting the catalyzed substrate with an electroless metallization plating solution, whereby a metal film is deposited on the substrate, wherein, prior to said step of contacting said substrate with said nucleophilic reagent, at least a portion of said substrate is exposed to sufficient actinic radiation to liberate a selected amount of halide or pseudohalide from said benzyl halide or said benzyl pseudohalide groups, to modify the reactivity of said substrate to said nucleophilic reagent, wherein said amount of actinic radiation is not more than about 100 mJ/cm 2 .

Claim 7

A process for modifying a substrate, comprising the steps of: a) providing a substrate having benzyl halide or benzyl pseudohalide groups on at least a portion of the substrate, and b) contacting the benzyl halide or benzyl pseudohalide functionalized substrate with a nucleophilic reagent with the general formula N-R, wherein N is a nucleophilic group and R is a group capable of imparting to the substrate a selected functionality, wherein said functional group R comprises a ligating moiety that is capable of binding an electroless metallization catalyst, c) contacting the ligand-modified substrate with an electroless metallization catalyst, and d) contacting the catalyzed substrate with an electroless metallization plating solution, whereby a metal film is deposited on the substrate, wherein, prior to said step of contacting said substrate with said nucleophilic reagent, at least a portion of said substrate is exposed to sufficient actinic radiation to liberate a selected amount of halide or pseudohalide from said benzyl halide or said benzyl pseudohalide groups, to modify the reactivity of said substrate to said nucleophilic reagent, wherein said amount of actinic radiation is not more than about 100 mJ/cm 2 .

Claim 8

The process of claim 5, wherein said actinic radiation is visible light, ultraviolet light, X-rays, γ-rays, electron beams, or ion beams.

Claim 9

The process of claim 5, wherein said actinic radiation is patterned.