US5854819A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same
Assignee: Canon Inc
•
Filing: 1997-02-06
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Granted: 1998-12-29
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Expires: 2017-02-06
Abstract
Abstract There is disclosed a mask supporting device comprising a chuck mechanism for supporting a mask substrate provided with a rectangular window in which a mask pattern is formed, and a frame for reinforcing the mask substrate, and a mechanism for applying, to said frame of the mask, loads from mutually orthogonal directions. The mechanism for applying loads includes a fixed reference contacting two positions on the external periphery of the mask frame and two pressing mechanism for applying loads to the mask frame from two directions respectively opposed to the two contact positions.
Inventors
- 👤 Shinichi Hara
- 👤 Takeshi Miyachi
- 👤 Nobutoshi Mizusawa
- 👤 Yuji Chiba
- 👤 Kazuyuki Kasumi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 22:46
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/707; G03F7/70708; G03F7/70783; G03F7/708
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
71 words
A mask supporting device comprising: a chuck mechanism for supporting an X-ray mask having a mask substrate provided with a rectangular window on which a mask pattern is formed and a frame for reinforcing said mask substrate; and a mechanism for applying loads to said frame of the mask from mutually orthogonal directions in a plane parallel with a surface of the mask pattern for deforming and correcting the mask pattern.
Claim 2
Dependent Claim
71 words
A mask supporting device comprising: a chuck mechanism for supporting an X-ray mask having a mask substrate provided with a rectangular window on which a mask pattern is formed and a frame for reinforcing said mask substrate; and a mechanism for applying loads to said frame of the mask from mutually orthogonal directions in a plane parallel with a surface of the mask pattern for deforming and correcting the mask pattern.
Claim 3
Dependent Claim
16 words
A mask supporting device according to claim 1, wherein said frame has a rectangular external periphery.
Claim 4
Dependent Claim
16 words
A mask supporting device according to claim 1, wherein said frame has a circular external periphery.
Claim 5
Dependent Claim
18 words
A mask supporting device according to claim 1, further comprising a detection mechanism for detecting the applied loads.
Claim 6
Dependent Claim
23 words
A mask supporting device according to claim 4, further comprising means for adjusting the applied loads on the detection of said detection mechanism.
Claim 7
Dependent Claim
23 words
A mask supporting device according to claim 1, wherein said chuck mechanism includes a mechanical damper for clamping said frame in plural positions.
Claim 8
Dependent Claim
20 words
A mask supporting device according to claim 1, wherein said chuck mechanism includes a vacuum, magnetic or electrostatic suction mechanism.
Claim 9
Dependent Claim
50 words
A mask supporting device according to claim 1, wherein said mechanism for applying loads includes a fixed reference contacting two positions on the external periphery of the mask frame and two pressing mechanisms for applying loads to the mask frame from two directions respectively opposed to said two contact positions.
Claim 10
Dependent Claim
48 words
A mask supporting device according to claim 1, wherein said mechanism for applying loads includes four pressing mechanisms for applying loads to the mask frame, toward the center of the mask, from the directions of extensions of mutually orthogonal two lines passing through the center of the mask.
Claim 11
Dependent Claim
27 words
A mask supporting device according to claim 1, wherein said mechanism for applying loads is capable of both pushing and pulling the external periphery of the frame.
Claim 12
Dependent Claim
74 words
A mask correcting method comprising the steps of: preparing an X-ray mask including a mask substrate provided with a rectangular window in which a mask pattern is formed, and a ring-shaped frame for reinforcing said mask substrate; and correcting the mask pattern by applying loads to the external periphery of said frame from mutually orthogonal directions in a plane parallel with a surface of the mask pattern, for deforming and correcting the mask pattern.
Claim 13
Dependent Claim
74 words
A mask correcting method comprising the steps of: preparing an X-ray mask including a mask substrate provided with a rectangular window in which a mask pattern is formed, and a ring-shaped frame for reinforcing said mask substrate; and correcting the mask pattern by applying loads to the external periphery of said frame from mutually orthogonal directions in a plane parallel with a surface of the mask pattern, for deforming and correcting the mask pattern.
Claim 14
Independent Claim
101 words
A device producing method comprising the steps of: correcting a mask by i) preparing an X-ray mask including a mask substrate provided with a rectangular window in which a mask pattern is formed, and a ring-shaped frame for reinforcing said mask substrate, and ii) correcting the mask pattern by applying loads to the external periphery of said frame from mutually orthogonal directions in a plane parallel with a surface of the mask pattern, for deforming and correcting the mask pattern; and transferring the mask onto a wafer, by irradiating a mask corrected by the mask correcting step with an exposure energy.
Claim 15
Independent Claim
101 words
A device producing method comprising the steps of: correcting a mask by i) preparing an X-ray mask including a mask substrate provided with a rectangular window in which a mask pattern is formed, and a ring-shaped frame for reinforcing said mask substrate, and ii) correcting the mask pattern by applying loads to the external periphery of said frame from mutually orthogonal directions in a plane parallel with a surface of the mask pattern, for deforming and correcting the mask pattern; and transferring the mask onto a wafer, by irradiating a mask corrected by the mask correcting step with an exposure energy.
Claim 16
Dependent Claim
63 words
An X-ray mask comprising: a mask substrate provided with a rectangular window in which a mask pattern is formed; a frame for reinforcing said mask substrate; and a plurality of strain gauges provided on said mask substrate for detecting loads respectively applied to said frame of the mask from mutually orthogonal directions in a plane parallel with a surface of the mask pattern.
Claim 17
Dependent Claim
63 words
An X-ray mask comprising: a mask substrate provided with a rectangular window in which a mask pattern is formed; a frame for reinforcing said mask substrate; and a plurality of strain gauges provided on said mask substrate for detecting loads respectively applied to said frame of the mask from mutually orthogonal directions in a plane parallel with a surface of the mask pattern.
Claim 18
Dependent Claim
88 words
An exposure apparatus comprising: a mask supporting device comprising, i) a chuck mechanism for supporting an X-ray mask having a mask substrate provided with a rectangular window on which a mask pattern is formed and a frame for reinforcing said mask substrate, and ii) a mechanism for applying loads to said frame of the mask from mutually orthogonal directions in a plane parallel with the surface of the mask pattern for deforming and correcting the mask pattern; and means for irradiating the supported mask with an exposure energy.
Claim 19
Dependent Claim
88 words
An exposure apparatus comprising: a mask supporting device comprising, i) a chuck mechanism for supporting an X-ray mask having a mask substrate provided with a rectangular window on which a mask pattern is formed and a frame for reinforcing said mask substrate, and ii) a mechanism for applying loads to said frame of the mask from mutually orthogonal directions in a plane parallel with the surface of the mask pattern for deforming and correcting the mask pattern; and means for irradiating the supported mask with an exposure energy.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-12-28 | 2002-06-29 | 2002-12-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-12-28 | 2006-06-29 | 2006-12-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-12-28 | 2010-06-29 | 2010-12-29 | $7700.00 | Window Closed / Lapsed |