US5901066A
Expired / Lapsed
US
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Automated method for adding attributes identified on a schematic diagram to an integrated circuit layout
Assignee: NXP USA Inc
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Filing: 1998-01-26
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Granted: 1999-05-04
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Expires: 2018-01-26
Abstract
Abstract An attribute on a netlist (31) is placed on a layout (33) to allow an automated approach for adding a feature to the layout (33) to be implemented. The netlist (31) or schematic diagram of a circuit is simulated on a Computer Aided Design (CAD) tool to verify circuit functionality. A layout tool (32) generates the layout (33) of the netlist (31). Adding a feature, for example, an extra implant to a source region of a device requires knowledge of device orientation not included in the layout (33). A Layout Versus Schematic (LVS) program (34) is run with the netlist (31) and the layout (33). Connectivity information from the LVS run is retrieved and placed in a connectivity mapping file (35). A mapping program (36) uses the connectivity mapping file (35) and the layout (33) to generate layers indicating and marking device orientation. The layers when added to the layout (33) produce an oriented layout (37). A layer generation program (38) uses the oriented layout (37) and the connectivity mapping file (35) to generate layers required to produce the feature on devices of the oriented layout (37).
Inventors
- 👤 Merit Hong
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 07:10
CPC Classifications
G; G06; G06F; G06F30/00; G06F30/30; G06F30/39; H; H10; H10D; H10D89/00; H10D89/10
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
102 words
A method of making an integrated circuit having a non-symmetrical device comprising the steps of: generating a non-oriented layout of the integrated circuit from a netlist having device orientation; generating a database correlating the non-oriented layout to the netlist; retrieving connectivity information from the database; and using a mapping program with said connectivity information to generate layers which identify device orientation on said non-oriented layout, wherein said layers which identify device orientation combined with said non-oriented layout form an oriented layout; and forming the non-symmetrical device on a substrate of the integrated circuit using a mask set generated from the oriented layout.
Claim 2
Independent Claim
102 words
A method of making an integrated circuit having a non-symmetrical device comprising the steps of: generating a non-oriented layout of the integrated circuit from a netlist having device orientation; generating a database correlating the non-oriented layout to the netlist; retrieving connectivity information from the database; and using a mapping program with said connectivity information to generate layers which identify device orientation on said non-oriented layout, wherein said layers which identify device orientation combined with said non-oriented layout form an oriented layout; and forming the non-symmetrical device on a substrate of the integrated circuit using a mask set generated from the oriented layout.
Claim 3
Dependent Claim
26 words
The method as recited in claim 1 wherein said step of retrieving connectivity information includes a step of placing said connectivity information in a mapping file.
Claim 4
Dependent Claim
32 words
The method as recited in claim 2 further comprising the step of placing polygons on said layers which identify device orientation, each polygon type corresponding to an attribute pertaining to device orientation.
Claim 5
Dependent Claim
24 words
The method of claim 1 wherein the step of generating a database comprises using a Layout Versus Schematic (LVS) program to generate the database.
Claim 6
Independent Claim
72 words
A method of manufacturing a semiconductor device comprising the steps of: generating a database of information correlating a layout of the semiconductor device to a schematic of the semiconductor device; adding an attribute of the schematic to the layout using information from said database correlating the attribute to the layout; generating masking layers which identify the attribute on the layout; forming the semiconductor device on a semiconductor substrate using the masking layers.
Claim 7
Independent Claim
72 words
A method of manufacturing a semiconductor device comprising the steps of: generating a database of information correlating a layout of the semiconductor device to a schematic of the semiconductor device; adding an attribute of the schematic to the layout using information from said database correlating the attribute to the layout; generating masking layers which identify the attribute on the layout; forming the semiconductor device on a semiconductor substrate using the masking layers.
Claim 8
Dependent Claim
24 words
The method of claim 5 wherein the step of generating a database comprises using a Layout Versus Schematic (LVS) program to generate the database.
Claim 9
Dependent Claim
31 words
The method of claim 6 further comprising the steps of: providing the schematic to a layout tool to generate the layout; and placing an attribute of device orientation on the schematic.
Claim 10
Independent Claim
74 words
A method of manufacturing a semiconductor device comprising the steps of: using a layout to generate a photolithographic mask; and using the mask to form select devices; wherein the layout has layers identifying an attribute of the select devices and is automatically generated by steps comprising: using a layout verification program to generate a database correlating a netlist to the layout; and adding the attribute to the layout using information retrieved from said database.
Claim 11
Independent Claim
74 words
A method of manufacturing a semiconductor device comprising the steps of: using a layout to generate a photolithographic mask; and using the mask to form select devices; wherein the layout has layers identifying an attribute of the select devices and is automatically generated by steps comprising: using a layout verification program to generate a database correlating a netlist to the layout; and adding the attribute to the layout using information retrieved from said database.
Claim 12
Dependent Claim
22 words
The method of claim 8 further comprising the steps of: providing a semiconductor substrate; forming the select devices on the semiconductor substrate.
Claim 13
Dependent Claim
78 words
The method of claim 8 wherein the automatic generation of the layout further comprises the steps of: providing the netlist to a layout tool to generate the layout wherein the attribute is not placed on the layout by the layout tool; and retrieving information from said database by said layout verification program that correlates the attribute of the select devices of the netlist to the layout; wherein said layout verification program comprises a Layout Versus Schematic (LVS) program.
Claim 14
Dependent Claim
76 words
The method of claim 8 wherein the automatic generation of the layout further comprises the steps of: generating a non-oriented layout from an oriented netlist of the semiconductor device, wherein the attribute is included in the oriented netlist; mapping the attribute from the oriented netlist to the non-oriented layout; and generating layers identifying the attribute, wherein the non-oriented layout and the layers identifying the attribute form the layout having layers identifying an attribute of select devices.
Claim 15
Independent Claim
44 words
A method of manufacturing an integrated circuit having a non-symmetrical device, the method comprising the step of using a mask generated from an automatically generated oriented layout of the integrated circuit, the oriented layout having layers indicating device orientation, to pattern the non-symmetrical device.
Claim 16
Independent Claim
44 words
A method of manufacturing an integrated circuit having a non-symmetrical device, the method comprising the step of using a mask generated from an automatically generated oriented layout of the integrated circuit, the oriented layout having layers indicating device orientation, to pattern the non-symmetrical device.
Claim 17
Dependent Claim
18 words
The method of claim 12 further comprising the step of generating the oriented layout of the integrated circuit.
Claim 18
Dependent Claim
91 words
The method of claim 13 wherein generating the oriented layout comprises the steps of: providing a netlist having device orientation; generating a non-oriented layout from said netlist with a layout tool; using a Layout Versus Schematic (LVS) program to generate a database correlating the non-oriented layout to said netlist; retrieving connectivity information from said database; and using a mapping program with said connectivity information to generate layers which identify device orientation on said non-oriented layout, wherein said layers which identify device orientation combined with said non-oriented layout form the oriented layout.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-05-03 | 2002-11-02 | 2003-05-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-05-03 | 2006-11-02 | 2007-05-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-05-03 | 2010-11-02 | 2011-05-04 | $7700.00 | Window Closed / Lapsed |