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US5952243A
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Removal rate behavior of spin-on dielectrics with chemical mechanical polish
Assignee: Honeywell International Inc
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Filing: 1996-06-24
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Granted: 1999-09-14
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Expires: 2016-06-24
Abstract
Abstract A method for forming a gap-filled, planarization structure of dielectric materials on a substrate topography useful for forming microelectronic devices. A dielectric material is first deposited as continuous, dry dielectric layer, preferably a SOG layer. Then the dielectric layer is partially removed by chemical-mechanical polishing (CMP). The chemical and mechanical properties of the structure can be chosen by varying the composition of the SOG layer and the subsequent CMP conditions.
Inventors
- 👤 Lynn Forester
- 👤 Dong K. Choi
- 👤 Reza Hosseini
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 18:30
CPC Classifications
H; H10; H10P; H10P95/00; H10P95/06; H10P95/062
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
103 words
A process for forming a void-free, continuous planarized dielectric substrate surface comprising: (a) spin coating a dielectric composition which comprises a material selected from the group consisting of silicates, phosphosilicates, siloxanes, silsesquioxane, organic polymers, copolymers and mixtures thereof, to a surface of a substrate in an amount sufficient to uniformly coat and fill voids continuously across the surface of the substrate; (b) curing said dielectric composition by an electron beam curing treatment; and (c) performing a chemical mechanical polishing step to said dielectric composition until said dielectric composition on said substrate surface is substantially planarized and continuous across the surface of the substrate.
Claim 2
Dependent Claim
103 words
A process for forming a void-free, continuous planarized dielectric substrate surface comprising: (a) spin coating a dielectric composition which comprises a material selected from the group consisting of silicates, phosphosilicates, siloxanes, silsesquioxane, organic polymers, copolymers and mixtures thereof, to a surface of a substrate in an amount sufficient to uniformly coat and fill voids continuously across the surface of the substrate; (b) curing said dielectric composition by an electron beam curing treatment; and (c) performing a chemical mechanical polishing step to said dielectric composition until said dielectric composition on said substrate surface is substantially planarized and continuous across the surface of the substrate.
Claim 3
Dependent Claim
38 words
The process of claim 1 further comprising heating the dielectric composition and substrate at a temperature and for a time sufficient to form a continuous, dry dielectric film on the surface after step (a) but before step (b).
Claim 4
Dependent Claim
32 words
The process of claim 2 wherein said dielectric composition is further cured by an additional subsequent heating before step (b) at a temperature of from about 2520 C. to about 250° C.
Claim 5
Dependent Claim
32 words
The process of claim 1 wherein the dielectric composition comprises a material selected from the group consisting of phenylsiloxanes, methylsiloxanes, methylphenylsiloxanes, phosphosiloxanes, methyl silsesquioxane, methylphenyl silsesquioxane, fluorinated poly(arylethers), copolymers and mixtures thereof.
Claim 6
Dependent Claim
65 words
The process of claim 1 wherein said dielectric composition comprises a siloxane having, based upon the total weight of said siloxane, of from about 2% to about 90% of organic groups comprising alkyl groups having from about 1 to about 10 carbons, aromatic groups having from about 4 to about 10 carbons, aliphatic groups having from about 4 to about 10 carbons, or mixtures thereof.
Claim 7
Dependent Claim
26 words
The process of claim 1 wherein said dielectric composition comprises from about 0% to about 10% phosphorus based on the total weight of the dielectric composition.
Claim 8
Dependent Claim
20 words
The process of claim 1 wherein said composition has a thickness of from about 500 Å to about 2 microns.
Claim 9
Dependent Claim
13 words
The process of claim 1 wherein the substrate comprises silicon or gallium arsenide.
Claim 10
Dependent Claim
17 words
The process of claim 1 wherein the chemical mechanical polishing is conducted with an alkali silica slurry.
Claim 11
Dependent Claim
21 words
The process of claim 1 wherein the chemical mechanical polishing is conducted with fumed silica slurry or a cerium oxide slurry.
Claim 12
Dependent Claim
29 words
The process of claim 1 wherein the chemical mechanical polishing is conducted with a pressure on the dielectric film of from about 10 to about 20 lbs/in 2 .
Claim 13
Dependent Claim
27 words
The process of claim 1 wherein the chemical mechanical polishing is conducted with a slurry composition having a pH range of from about 2.8 to about 11.
Claim 14
Dependent Claim
27 words
The process of claim 1 wherein the chemical mechanical polishing is conducted with a slurry composition having a pH range of from about 10.3 to about 11.
Claim 15
Dependent Claim
26 words
The process of claim 1 further comprising the subsequent steps of repeating steps (a) and (b) and (c) at least once to the planarized substrate surface.
Claim 16
Dependent Claim
15 words
The process of claim 1 wherein the surface comprises a pattern of metallic electrical conductors.
Claim 17
Dependent Claim
25 words
The process of claim 1 wherein the surface comprises a pattern of metallic electrical conductors and a layer of an oxide on the metal conductors.
Claim 18
Dependent Claim
43 words
The process of claim 1 wherein the surface comprises a pattern of metallic electrical conductors and a layer of an oxide on the metallic conductors and the process further comprises depositing a second oxide layer on the dielectric layer before conducting step (c).
Claim 19
Dependent Claim
113 words
A process for treating a semiconductor substrate surface comprising a) spin depositing a layer of a liquid dielectric composition which comprises a material selected from the group consisting of silicates, phosphosilicates, siloxanes, silsesquioxane, organic polymers, copolymers and mixtures thereof, continuously across a surface of a semiconductor substrate; b) heating said dielectric layer at a temperature and for a time sufficient to form a continuous, dry dielectric layer on the surface; c) curing said dielectric composition by an electron beam curing treatment; and d) chemical-mechanical polishing the dielectric layer to remove at least a portion of the dielectric layer and produce a substantially planarized and continuous dielectric layer across the surface of the substrate.
Claim 20
Dependent Claim
113 words
A process for treating a semiconductor substrate surface comprising a) spin depositing a layer of a liquid dielectric composition which comprises a material selected from the group consisting of silicates, phosphosilicates, siloxanes, silsesquioxane, organic polymers, copolymers and mixtures thereof, continuously across a surface of a semiconductor substrate; b) heating said dielectric layer at a temperature and for a time sufficient to form a continuous, dry dielectric layer on the surface; c) curing said dielectric composition by an electron beam curing treatment; and d) chemical-mechanical polishing the dielectric layer to remove at least a portion of the dielectric layer and produce a substantially planarized and continuous dielectric layer across the surface of the substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2002-09-13 | 2003-03-15 | 2003-09-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-09-13 | 2007-03-15 | 2007-09-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-09-13 | 2011-03-15 | 2011-09-14 | $7700.00 | Window Closed / Lapsed |