Patent US6517977B2 successfully refreshed from Google Patents.
US6517977B2
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Lithographic template and method of formation and use
Assignee: NXP USA Inc
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Filing: 2001-03-28
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Granted: 2003-02-11
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Expires: 2021-03-28
Abstract
Abstract This invention relates to semiconductor devices, microelectronic devices, micro electro mechanical devices, microfluidic devices, and more particularly to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template ( 20, 30, 42 ) is formed having a substrate ( 22, 32 ) and a template pedestal ( 24, 34 ) having formed thereon an uppermost surface an etched pattern or relief image ( 26, 36, 48 ). The template ( 20, 30, 42 ) is used in the fabrication of a semiconductor device ( 44 ) for affecting a pattern in the device ( 44 ) by positioning the template ( 20, 30, 42 ) in close proximity to semiconductor device ( 44 ) having a radiation sensitive material ( 50 ) formed thereon and applying a pressure ( 52 ) to cause the radiation sensitive material ( 50 ) to flow into the relief image ( 48 ) present on the template ( 42 ). Radiation ( 53 ) is then applied through the template ( 42 ) so as to further cure portions of the radiation sensitive material ( 50 ) and further define the pattern in the radiation sensitive material ( 5 0). The template ( 20, 30, 42 ) is then removed to complete fabrication of semiconductor device ( 44 ).
Inventors
- 👤 Doug J. Resnick
- 👤 Kevin J. Nordquist
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 05:41
CPC Classifications
B; B29; B29C; B29C43/00; B29C43/003; G; G03; G03F; G03F9/00; B29C43/02; B29C43/021; B82; B82Y; B82Y10/00; B82Y40/00; G03F7/00; G03F7/0002; G03F7/0017; B29C2043/023; B29C2043/025
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
44 words
A method of forming a lithographic template comprising the steps of: providing a substrate, the substrate having an uppermost surface and having defined thereon the uppermost surface a template pedestal, wherein an etched pattern is formed on an uppermost surface of the template pedestal.
Claim 2
Independent Claim
44 words
A method of forming a lithographic template comprising the steps of: providing a substrate, the substrate having an uppermost surface and having defined thereon the uppermost surface a template pedestal, wherein an etched pattern is formed on an uppermost surface of the template pedestal.
Claim 3
Dependent Claim
66 words
A method of forming a lithographic template as claimed in claim 1 , wherein the step of providing a substrate is further characterized as providing a substrate that is one of rectangular in shape, circular in shape, circular in shape including a flat formed on a peripheral surface for alignment purposes, or circular in shape including a notch formed on a peripheral surface for alignment purposes.
Claim 4
Dependent Claim
37 words
A method for forming a lithographic template as claimed in claim 1 , wherein the step of providing a substrate is further characterized as providing a substrate of one of an opaque material or a transparent material.
Claim 5
Dependent Claim
99 words
A method of forming a lithographic template as claimed in claim 3 wherein the step of providing a substrate having an uppermost surface and having defined thereon an uppermost surface a template pedestal, wherein an etched pattern is formed on an uppermost surface of the template pedestal includes the steps of: etching the substrate to form a template pedestal; forming a patterned resist layer on the uppermost surface of the template pedestal; etching the uppermost surface of the template pedestal, thereby defining an etched pattern on the uppermost surface of the template pedestal; and removing the patterned resist layer.
Claim 6
Dependent Claim
111 words
A method of forming a lithographic template as claimed in claim 3 wherein the step of providing a substrate having an uppermost surface and having defined thereon an uppermost surface a template pedestal, wherein an etched pattern is formed on an uppermost surface of the template pedestal includes the steps of: providing a substrate having a surface; forming a patterned resist layer on a portion of the surface of the substrate; etching the portion of the substrate underlying the patterned resist layer, thereby defining an etched pattern on the portion of the substrate; etching the substrate to define a template pedestal, having formed there on an uppermost surface, the etched pattern.
Claim 7
Dependent Claim
30 words
A lithographic template comprising: a substrate having a surface; and a template pedestal formed on the surface of the substrate and having defined therein an uppermost surface a relief image.
Claim 8
Dependent Claim
30 words
A lithographic template comprising: a substrate having a surface; and a template pedestal formed on the surface of the substrate and having defined therein an uppermost surface a relief image.
Claim 9
Dependent Claim
57 words
A method of forming a lithographic template as claimed in claim 6 , wherein the substrate is further characterized as one of rectangular in shape, circular in shape, circular in shape including a flat formed on a peripheral surface for alignment purposes, or circular in shape including a notch formed on a peripheral surface for alignment purposes.
Claim 10
Dependent Claim
24 words
A lithographic template as claimed in claim 6 , wherein the substrate is formed as one of a transparent substrate or an opaque substrate.
Claim 11
Dependent Claim
43 words
A lithographic template as claimed in claim 8 , wherein the transparent substrate is further characterized as one of a quartz material, a polycarbonate material, a calcium fluoride (CaF 2 ) material, a magnesium fluoride (MgF 2 ) material, or a pyrex material.
Claim 12
Dependent Claim
19 words
A lithographic template as claimed in claim 8 , wherein the template pedestal is integrally formed with the substrate.
Claim 13
Dependent Claim
23 words
A lithographic template as claimed in claim 8 , wherein the template pedestal is formed to protrude from the surface of the substrate.
Claim 14
Independent Claim
109 words
A method for making a device comprising the steps of: providing a substrate; coating the substrate with a material layer characterized as deformable in response to a pressure applied thereto; fabricating a lithographic template, wherein the lithographic template comprises; a substrate having a surface; and a template pedestal formed on the surface of the substrate and having defined therein an uppermost surface a relief image; positioning the lithographic template in contact with the material layer, the material layer being between the template and the substrate; applying pressure to the template, the material layer thereby deforming into the relief pattern on the template; and removing the template from the substrate.
Claim 15
Independent Claim
109 words
A method for making a device comprising the steps of: providing a substrate; coating the substrate with a material layer characterized as deformable in response to a pressure applied thereto; fabricating a lithographic template, wherein the lithographic template comprises; a substrate having a surface; and a template pedestal formed on the surface of the substrate and having defined therein an uppermost surface a relief image; positioning the lithographic template in contact with the material layer, the material layer being between the template and the substrate; applying pressure to the template, the material layer thereby deforming into the relief pattern on the template; and removing the template from the substrate.
Claim 16
Dependent Claim
22 words
A method for making a device as claimed in claim 12 , wherein the material layer is a radiation sensitive material layer.
Claim 17
Dependent Claim
29 words
A method for making a device as claimed in claim 13 wherein the radiation sensitive material layer is further characterized as coating the substrate with a photocurable material layer.
Claim 18
Dependent Claim
49 words
A method for making a device as claimed in claim 13 , further including the step of transmitting radiation through the lithographic template to expose at least a portion of the radiation sensitive material layer on the substrate, thereby further affecting the pattern in the radiation sensitive material layer.
Claim 19
Dependent Claim
33 words
A method for making a device as claimed in claim 15 , wherein the step of transmitting radiation through the lithographic template is further characterized as transmitting ultraviolet light through the lithographic template.
Claim 20
Dependent Claim
34 words
A method for making a device as claimed in claim 15 , wherein the step of transmitting radiation through the lithographic template is further characterized as transmitting deep ultraviolet light through the lithographic template.
Claim 21
Dependent Claim
32 words
A method for making a device as claimed in claim 12 wherein the device is one of a semiconductor device, a microelectronic device, a micro electro mechanical device, or a microfluidic device.
References Cited (Backward Citations)
US6387787B1
Cited
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2006-02-10 | 2006-08-12 | 2007-02-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2010-02-10 | 2010-08-12 | 2011-02-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2014-02-10 | 2014-08-12 | 2015-02-11 | $7700.00 | Window Closed / Lapsed |