US6847433B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Holder, system, and process for improving overlay in lithography
Assignee: Bell Semiconductor LLC
•
Filing: 2002-06-03
•
Granted: 2005-01-25
•
Expires: 2022-06-03
Abstract
Abstract A deformable holder, system, and process where long range errors (any of lithography, metrology, or overlay errors) between the image of a mask and an existing pattern on a wafer from a number of potential sources are corrected. The long range errors are determined using either a through-the-lens alignment metrology system or an around-the-lens metrology system. Deformation values are determined to compensate for the longe range errors. The deformation values are determined by either solving simultaneous equations or by finite-element linear-stress-analysis (FEA). The mask or wafer is then distorted, in-plane, by an amount related to the determined deformation values using an actuator such an a piezoelectric ceramic to push or pull the mask or wafer to substantially realign the projected image of the mask and the existing pattern on the wafer.
Inventors
- 👤 Donald L. White
- 👤 II Obert Reeves Wood
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 02:13
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/0002; B; B82; B82Y; B82Y10/00; B82Y40/00; G03F7/70; G03F7/70483; G03F7/70605; G03F7/70616; G03F7/70633; G03F7/70691; G03F7/70783; Y; Y10; Y10S; Y10S430/00; Y10S430/167; Y10S430/168
Claims Analysis
Total Claims: 41
Claim 1
Independent Claim
55 words
A process for device fabrication comprising: inspecting a tool including a mask for long range error in one of either the mask or an image produced by the mask; determining deformation values to compensate for the long range errors; and deforming the mask using the determined deformation values to compensate for the long range errors.
Claim 2
Dependent Claim
55 words
A process for device fabrication comprising: inspecting a tool including a mask for long range error in one of either the mask or an image produced by the mask; determining deformation values to compensate for the long range errors; and deforming the mask using the determined deformation values to compensate for the long range errors.
Claim 3
Dependent Claim
17 words
The process of claim 1 , wherein mask is imaged on the substrate by a projection lens.
Claim 4
Dependent Claim
17 words
The process of claim 1 , wherein the mask is imaged on the substrate by projection printing.
Claim 5
Dependent Claim
23 words
The process of claim 3 , wherein the projection printing includes one of optical, ultraviolet (UV), deep UV, extreme UV, and x-ray printing.
Claim 6
Dependent Claim
30 words
The process of claim 1 , wherein the proximity of the mask to the wafer causes the image of the pattern on the mask to be transferred to the wafer.
Claim 7
Dependent Claim
17 words
The process of claim 5 , wherein the mask is imaged on the wafer by nano imprinting.
Claim 8
Dependent Claim
17 words
The process of claim 5 , wherein the mask is imaged on the wafer by contact printing.
Claim 9
Dependent Claim
16 words
The process of claim 1 , wherein the long range errors are determined from alignment marks.
Claim 10
Dependent Claim
26 words
The process of claim 1 , wherein the long range errors are determined by one of a through-the-lens alignment metrology system and an around-the-lens metrology system.
Claim 11
Dependent Claim
37 words
The process of claim 1 , wherein the long range errors are caused by at least one of a mask writing error, mask strain, lens distortion, wafer distortion, stage error, previous levels of lithography, and chuck distortions.
Claim 12
Dependent Claim
26 words
The process of claim 1 , wherein the deformation values are determined by one of solving simultaneous equations and finite-element linear-stress-analysis (FEA) or a combination thereof.
Claim 13
Dependent Claim
19 words
The process of claim 1 , wherein the mask is deformed by applying voltages to at least one actuator.
Claim 14
Dependent Claim
15 words
The process of claim 12 , wherein the actuators are piezoelectric ceramic, electrostrictive, or magnetostrictive.
Claim 15
Independent Claim
64 words
A system for device fabrication, comprising: a sub-system for inspecting a tool including a mask for long range errors in one of either the mask or an image produced by the mask; a computer for determining deformation values to compensate for the long range errors; and a holder for deforming the mask using the determined deformation values to compensate for the long range errors.
Claim 16
Independent Claim
64 words
A system for device fabrication, comprising: a sub-system for inspecting a tool including a mask for long range errors in one of either the mask or an image produced by the mask; a computer for determining deformation values to compensate for the long range errors; and a holder for deforming the mask using the determined deformation values to compensate for the long range errors.
Claim 17
Dependent Claim
18 words
The system of claim 14 , wherein the mask is imaged on a substrate by a projection lens.
Claim 18
Dependent Claim
17 words
The system of claim 14 , wherein the mask is imaged on a substrate by projection printing.
Claim 19
Dependent Claim
23 words
The system of claim 16 , wherein the projection printing includes one of optical, ultraviolet (UV), deep UV, extreme UV, and x-ray printing.
Claim 20
Dependent Claim
30 words
The system of claim 14 , wherein the proximity of the mask to the wafer causes the image of the pattern on the mask to be transferred to the wafer.
Claim 21
Dependent Claim
17 words
The system of claim 18 , wherein the mask is imaged on the wafer by nano imprinting.
Claim 22
Dependent Claim
17 words
The system of claim 18 , wherein the mask is imaged on the wafer by contact printing.
Claim 23
Dependent Claim
16 words
The system of claim 14 , wherein the long range errors are determined from alignment marks.
Claim 24
Dependent Claim
26 words
The system of claim 14 , wherein the long range errors are determined by one of a through-the-lens alignment metrology system and an around-the-lens metrology system.
Claim 25
Dependent Claim
37 words
The system of claim 14 , wherein the long range errors are caused by at least one of a mask writing error, mask strain, lens distortion, wafer distortion, stage error, previous levels of lithography, and chuck distortions.
Claim 26
Dependent Claim
26 words
The system of claim 14 , wherein the deformation values are determined by one of solving simultaneous equations and finite-element linear-stress-analysis (FEA) or a combination thereof.
Claim 27
Dependent Claim
20 words
The system of claim 14 , wherein the the mask is deformed by applying voltages to at least one actuator.
Claim 28
Dependent Claim
15 words
The system of claim 25 , wherein the actuators are piezoelectric ceramic, electrostrictive, or magnetostrictive.
Claim 29
Dependent Claim
91 words
A holder, comprising: a frame in which a mask or substrate may be placed; and at least one actuator between the frame and the mask, for receiving at least one deformation value for canceling a long range error from at least one of a plurality of sources between the projected image of the mask and an existing pattern on the substrate and for deforming the mask in accordance with the at least one deformation value to substantially realign the projected image of the mask and the existing pattern on the substrate.
Claim 30
Dependent Claim
91 words
A holder, comprising: a frame in which a mask or substrate may be placed; and at least one actuator between the frame and the mask, for receiving at least one deformation value for canceling a long range error from at least one of a plurality of sources between the projected image of the mask and an existing pattern on the substrate and for deforming the mask in accordance with the at least one deformation value to substantially realign the projected image of the mask and the existing pattern on the substrate.
Claim 31
Dependent Claim
18 words
The holder of claim 27 , wherein the at least one actuator is piezoelectric ceramic, electrostrictive, or magnetostrictive.
Claim 32
Dependent Claim
26 words
The holder of claim 27 , further comprising a buffer block wherein said buffer block and said at least one actuator meet at a contact point.
Claim 33
Dependent Claim
37 words
The holder of claim 27 , wherein the long range error is caused by at least one of a mask writing error, mask strain, lens distortion, wafer distortion, stage error, previous levels of lithography, and chuck distortions.
Claim 34
Dependent Claim
17 words
The holder of claim 27 , wherein said at least one actuator is opposed by another actuator.
Claim 35
Dependent Claim
19 words
The holder of claim 27 , wherein said at least one actuator is opposed by a stud or pin.
Claim 36
Dependent Claim
65 words
A process for device fabrication comprising: inspecting a tool including a mask for long range errors in one of either the mask or an image produced by the mask; determining deformation values to compensate for the long range errors; and deforming the mask and a substrate in an image plane of the tool using the determined deformation values to compensate for the long range errors.
Claim 37
Dependent Claim
65 words
A process for device fabrication comprising: inspecting a tool including a mask for long range errors in one of either the mask or an image produced by the mask; determining deformation values to compensate for the long range errors; and deforming the mask and a substrate in an image plane of the tool using the determined deformation values to compensate for the long range errors.
Claim 38
Independent Claim
91 words
A system for device fabrication, comprising: a sub-system for inspecting a tool including a mask for long range errors in one of either the mask or an image produced by the mask; a computer for determining deformation values to compensate for the long range errors; a first holder for deforming the mask using the determined deformation values to compensate for the long range errors; and a second holder for deforming the substrate in an image plane of the tool using the determined deformation values to compensate for the long rage errors.
Claim 39
Independent Claim
91 words
A system for device fabrication, comprising: a sub-system for inspecting a tool including a mask for long range errors in one of either the mask or an image produced by the mask; a computer for determining deformation values to compensate for the long range errors; a first holder for deforming the mask using the determined deformation values to compensate for the long range errors; and a second holder for deforming the substrate in an image plane of the tool using the determined deformation values to compensate for the long rage errors.
Claim 40
Dependent Claim
86 words
A holder, comprising: a frame in which a mask may be placed; and a plurality of actuators, for receiving at least one deformation value for canceling a long range error from at least one of a plurality of sources between the projected image of the mask and an existing pattern on a substrate and for deforming the mask and the substrate in accordance with the at least one deformation value to substantially realign the projected image of the mask and the existing pattern on the substrate.
Claim 41
Dependent Claim
86 words
A holder, comprising: a frame in which a mask may be placed; and a plurality of actuators, for receiving at least one deformation value for canceling a long range error from at least one of a plurality of sources between the projected image of the mask and an existing pattern on a substrate and for deforming the mask and the substrate in accordance with the at least one deformation value to substantially realign the projected image of the mask and the existing pattern on the substrate.
References Cited (Backward Citations)
US4385434A
Cited
US4760265A
Cited
US5420436A
Cited
US6219130B1
Cited
US6093511A
Cited
US6414326B1
Cited
US6556281B1
Cited
US20020011573A1
Cited
US20020105628A1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2008-01-25 | 2008-07-26 | 2009-01-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2012-01-25 | 2012-07-26 | 2013-01-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2016-01-25 | 2016-07-26 | 2017-01-25 | $7700.00 | Window Closed / Lapsed |