Homopolymers, copolymers and coated material and its use

Claim 2

A process for the preparation of a protective film which comprises irradiating with high-energy radiation a coated material composed of a substrate to which has been applied a layer of homopolymer or copolymer having an average molecular weight of at least 2000 and which contains at least 5 mole %, relative to the polymer, of at least one structural element of the formula I or II ##STR85## in which R 1 is halogen, nitro or C 1 -C 6 -alkyl, C 1 -C 6 -alkoxy or C 1 -C 6 -alkylthio, each of which can be substituted by phenyl, or is phenyl, phenoxy or phenylthio, R 2 is a direct bond, --O--, --S--, --CH 2 --, ethylidene, 2,2-propylidene or --CO--, R 3 is a hydrogen atom or aroyl or is as defined for R 1 , a is 0, 1, 2 or 3, b is 0, 1, 2, 3 or 4, c and d are 0, 1, 2, 3, 4 or 5 and q is 0 or 1, and R and R' are a substituted or unsubstituted divalent aliphatic radical which can be interrupted by hetero-atoms or by aromatic, heterocyclic or cycloaliphatic groups, or are a substituted or unsubstituted, cycloaliphatic or araliphatic radical, an aromatic radical in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl group, cycloalkyl group, alkoxy group, alkoxyalkyl group, alkylthio group, alkylthioalkyl group or aralkyl group, or two adjacent C atoms of the aromatic radical are substituted by an alkylene group, R being an aromatic radical which is substituted in the two ortho-positions relative to at least one N atom of two adjacent C atoms of the aromatic radical are substituted by alkylene, if q is 0.

Claim 3

A process according to claim 1 wherein the structural elements have the formula Ia, Ib or IIa ##STR86## in which q, R and R' are as defined in claim 1.

Claim 4

A process according to claim 1 where in the polymer the substituent is alkyl, alkoxy or alkoxyalkyl having 1 to 6 C atoms, benzyl, trimethylene or tetramethylene.

Claim 5

A process according to claim 1 where in the polymer one or two substituents in the aromatic radical are attached in the ortho-position relative to the N atom.

Claim 6

A process according to claim 1 where in the polymer R as an aliphatic radical contains 2 to 30 C atoms, as a cycloaliphatic radical contains 5 to 8 ring C atoms, as an araliphatic radical contains 7 to 30 C atoms, as an aromatic radical having aryl nuclei linked via an aliphatic group contains 13 to 30 C atoms and as a substituted aromatic radical contains 7 to 30 C atoms.

Claim 7

A process according to claim 1 wherein the homopolymer or copolymer is selected from the group consisting of the polyimides, polyamides, saturated polyesters, polycarbonates, polyamide-imides, polyester-imides, polyester-amides, polysiloxanes, unsaturated polyesters, epoxide resins, aromatic polyethers, aromatic polyether-ketones, aromatic polyether sulfones, aromatic polyketones, aromatic polythioethers and mixtures of these polymers.

Claim 8

A process according to claim 6 wherein the polymer comprises a homopolyimide or copolyimide containing 5 to 100 mole % of structural elements of the formulae I and/or II in which q is 0 and R is an aromatic radical which is substituted in the two ortho-positions of at least one N atom by alkyl, cycloalkyl, alkoxy, alkoxyalkyl, alkylthio, alkylthioalkyl or aralkyl, or two adjacent C atoms of the aromatic radical are substituted by alkylene, and containing 0 to 95 mole % of structural elements of the formula III ##STR87## in which Q is a tetravalent organic radical and R 13 is a divalent organic radical and R 13 is as defined for R.

Claim 9

A process according to claim 7 wherein Q is ##STR88## in which R 14 is a direct bond or a bridge group of the formulae ##STR89## in which R 15 , R 16 and R 17 are alkyl having 1 to 6 C atoms, phenyl or benzyl, and R 16 and R 17 are alkoxy having 1 to 6 C atoms, phenoxy or benzyloxy.

Claim 10

A process according to claim 7 wherein R in formula I and II is a radical of the formulae ##STR90## in which the free bonds are in the meta-position or para-position relative to one another, or of the formula ##STR91## in which R 18 and R 19 independently are methyl, ethyl, n-propyl or isopropyl and R 20 and R 21 are a hydrogen atom or are as defined for R 19 , or R 18 and R 20 together are trimethylene or tetramethylene, and R 20 and R 22 are a hydrogen atom and R 24 is a direct bond, CH 2 or CO.

Claim 11

A process according to claim 1 wherein the polymer consists of recurring structural elements of the formulae ##STR92## or mixtures of these structural elements.

Claim 12

A process for the preparation of a photographic relief image which comprises irradiating with high-energy radiation imagewise through a photomask a coated material composed of a substrate to which has been applied a layer of homopolymer or copolymer, having an average molecular weight of at least 2000 and which contains at least 5 mole %, relative to the polymer, of at least one structural element of the formula I or II ##STR93## in which R 1 is halogen, nitro or C 1 -C 6 -alkyl, C 1 -C 6 -alkoxy or C 1 -C 6 -alkylthio, each of which can be substituted by phenyl, or is phenyl, phenoxy or phenylthio, R 2 is a direct bond, --O--, --S--, --CH 2 --, ethylidene, 2,2-propylidene or --CO--, R 3 is a hydrogen atom or aroyl or is as defined for R 1 , a is 0, 1, 2 or 3, b is 0, 1, 2, 3 or 4, c and d are 0, 1, 2, 3, 4 or 5 and q is 0 or 1, and R and R' are a substituted or unsubstituted divalent aliphatic radical which can be interrupted by hetero-atoms or by aromatic, heterocyclic or cycloaliphatic groups, or are a substituted or unsubstituted, cycloaliphatic or araliphatic radical, an aromatic radical in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl group, cycloalkyl group, alkoxy group, alkoxyalkyl group, alkylthio group, alkylthioalkyl group or aralkyl group, or two adjacent C atoms of the aromatic radical are substituted by an alkylene group, R being n aromatic radical which is substituted in the two ortho-positions relative to at least one N atom or two adjacent C atoms of the aromatic radical are substituted by alkylene, if q is 0, and then removing the unexposed portions with a developer.

Claim 13

A process for the preparation of a photographic relief image which comprises irradiating with high-energy radiation imagewise through a photomask a coated material composed of a substrate to which has been applied a layer of homopolymer or copolymer, having an average molecular weight of at least 2000 and which contains at least 5 mole %, relative to the polymer, of at least one structural element of the formula I or II ##STR93## in which R 1 is halogen, nitro or C 1 -C 6 -alkyl, C 1 -C 6 -alkoxy or C 1 -C 6 -alkylthio, each of which can be substituted by phenyl, or is phenyl, phenoxy or phenylthio, R 2 is a direct bond, --O--, --S--, --CH 2 --, ethylidene, 2,2-propylidene or --CO--, R 3 is a hydrogen atom or aroyl or is as defined for R 1 , a is 0, 1, 2 or 3, b is 0, 1, 2, 3 or 4, c and d are 0, 1, 2, 3, 4 or 5 and q is 0 or 1, and R and R' are a substituted or unsubstituted divalent aliphatic radical which can be interrupted by hetero-atoms or by aromatic, heterocyclic or cycloaliphatic groups, or are a substituted or unsubstituted, cycloaliphatic or araliphatic radical, an aromatic radical in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl group, cycloalkyl group, alkoxy group, alkoxyalkyl group, alkylthio group, alkylthioalkyl group or aralkyl group, or two adjacent C atoms of the aromatic radical are substituted by an alkylene group, R being n aromatic radical which is substituted in the two ortho-positions relative to at least one N atom or two adjacent C atoms of the aromatic radical are substituted by alkylene, if q is 0, and then removing the unexposed portions with a developer.

Claim 14

A process according to claim 11 wherein the structural elements have the formula Ia, Ib or IIa ##STR94## in which q, R and R' are as defined in claim 11.

Claim 15

A process according to claim 11 where in the polymer the substituent is alkyl, alkoxy or alkoxyalkyl having 1 to 6 C atoms, benzyl, trimethylene or tetramethylene.

Claim 16

A process according to claim 11 where in the polymer one or two substituents in the aromatic radical are attached in the ortho-position relative to the N atom.

Claim 17

A process according to claim 11 where in the polymer R as an aliphatic radical contains 2 to 30 C atoms, as a cycloaliphatic radical contains 5 to 8 ring C atoms, as an araliphatic radical contains 7 to 30 C atoms, as an aromatic radical having aryl nuclei linked via an aliphatic group contains 13 to 30 C atoms and as a substituted aromatic radical contains 7 to 30 C atoms.

Claim 18

A process according to claim 11 wherein the homopolymer or copolymer is selected from the group consisting of the polyimides, polyamides, saturated polyesters, polycarbonates, polyamide-imides, polyester-imides, polyester-amides, polysiloxanes, unsaturated polyesters, epoxide resins, aromatic polyethers, aromatic polyether-ketones, aromatic polyether sulfones, aromatic polyketones, aromatic polythioethers and mixtures of these polymers.

Claim 19

A process according to claim 16 wherein the polymer comprises a homopolyimide or copolyimide containing 5 to 100 mole % of structural elements of the formulae I and/or II in which q is 0 and R is an aromatic radical which is substituted in the two ortho-positions of at least one N atom by alkyl, cycloalkyl, alkoxy, alkoxyalkyl, alkylthio, alkylthioalkyl or aralkyl, or two adjacent C atoms of the aromatic radical are substituted by alkylene, and containing 0 to 95 mole % of structural elements of the formula III ##STR95## in which Q is a tetravalent organic radical and R 13 is a divalent organic radical and R 13 is as defined for R.

Claim 20

A process according to claim 17 wherein Q is ##STR96## in which R 14 is a direct bond or a bridge group of the formulae ##STR97## in which R 15 , R 16 and R 17 are alkyl having 1 to 6 C atoms, phenyl or benzyl, and R 16 and R 17 are alkoxy having 1 to 6 C atoms, phenoxy or benzyloxy.

Claim 21

A process according to claim 17 wherein R in formula I and II is a radical of the formula ##STR98## in which the free bonds are in the meta-position or para-position relative to one another, or of the formula ##STR99## in which R 18 and R 19 independently are methyl, ethyl, n-propyl or isopropyl and R 20 and R 21 are a hydrogen atom or are as defined for R 19 , or R 18 or R 20 together are trimethylene or tetramethylene, and R 20 and R 22 are a hydrogen atom and R 24 is a direct bond, CH 2 or CO.

Claim 22

A process according to claim 11 wherein the polymer consists of recurring structural elements of the formulae ##STR100## or mixtures of these structural elements.