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US4685014A Expired / Lapsed US ⏱️ 0.0 years remaining

Production method of thin film magnetic head

Assignee: Hitachi Ltd
•
Filing: 1982-07-29
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Granted: 1987-08-04
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Expires: 2002-07-29
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Abstract

Abstract In producing a magnetic head by thin film technique, a magnetic film is formed on an insulating member covering coil conductor films after the surface of the insulating member is flattened. After a flattening coating is formed on the insulating member, the flattening coating as well as the insulating member are etched by plasma-assisted etching technique in order to flatten the surface.

Inventors

  • 👤 Masanobu Hanazono
  • 👤 Shinichi Hara
  • 👤 Hirosi Akiyama
  • 👤 Masaaki Hayashi
  • 👤 Harunobu Saitoo
  • 👤 Takumi Kurisu

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 17:28
CPC Classifications
G; G11; G11B; G11B5/00; G11B5/127; G11B5/31; G11B5/3163; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/4902; Y10T29/49021; Y10T29/49032; Y10T29/49036; Y10T29/49043; Y10T29/49044; Y10T29/4906; Y10T29/49064

Claims Analysis

Total Claims: 27
Claim 1
Independent Claim 348 words
A production method of a thin film magnetic head, said thin film magnetic head including: a lower magnetic film; an upper magnetic film having one end thereof coming into contact with one end of said lower magnetic film and having an end opposite to said one end facing a corresponding end of said lower magnetic film via a magnetic gap, thereby forming a magnetic circuit having a magnetic gap at a part thereof in cooperation with said lower magnetic film; coil conductor films having part thereof passing between said upper and lower magnetic films and crossing said magnetic circuit, and having a predetermined number of windings; and an insulating member made of an organic material electrically insulating said coil conductor films from one another and said coil conductor films from at least said upper magnetic film; said upper and lower magnetic films, said coil conductor films and said insulating member being formed in lamination by thin film technique; said method characterized in that a flattening coating made of a further organic material, having a surface, is formed on a portion of said insulating member at which said upper magnetic film is to be formed, wherein said portion of said insulating member at which the upper magnetic film is to be formed has a concavo-convex surface before etching of said portion, the flattening coating being formed, before the formation of said upper magnetic film, in such a thickness that the surface of said flattening coating can be flattened; and then etching is performed to etch said flattening coating and parts of said insulating member so as to expose the entire portion of said insulating member on which said upper magnetic film is to be formed such that the surface of said portion is flattened, the portion, ranging from the surface of said flattening coating to said insulating member, being etched and changed into a substantially flat surface having a height up to 0.1 μm by plasma-assisted etching technique under such a condition where the etching speed of said flattening coating is substantially equal to that of said insulating member.
Claim 2
Dependent Claim 348 words
A production method of a thin film magnetic head, said thin film magnetic head including: a lower magnetic film; an upper magnetic film having one end thereof coming into contact with one end of said lower magnetic film and having an end opposite to said one end facing a corresponding end of said lower magnetic film via a magnetic gap, thereby forming a magnetic circuit having a magnetic gap at a part thereof in cooperation with said lower magnetic film; coil conductor films having part thereof passing between said upper and lower magnetic films and crossing said magnetic circuit, and having a predetermined number of windings; and an insulating member made of an organic material electrically insulating said coil conductor films from one another and said coil conductor films from at least said upper magnetic film; said upper and lower magnetic films, said coil conductor films and said insulating member being formed in lamination by thin film technique; said method characterized in that a flattening coating made of a further organic material, having a surface, is formed on a portion of said insulating member at which said upper magnetic film is to be formed, wherein said portion of said insulating member at which the upper magnetic film is to be formed has a concavo-convex surface before etching of said portion, the flattening coating being formed, before the formation of said upper magnetic film, in such a thickness that the surface of said flattening coating can be flattened; and then etching is performed to etch said flattening coating and parts of said insulating member so as to expose the entire portion of said insulating member on which said upper magnetic film is to be formed such that the surface of said portion is flattened, the portion, ranging from the surface of said flattening coating to said insulating member, being etched and changed into a substantially flat surface having a height up to 0.1 μm by plasma-assisted etching technique under such a condition where the etching speed of said flattening coating is substantially equal to that of said insulating member.
Claim 3
Dependent Claim 38 words
The production method of a thin film magnetic head as defined in claim 1 wherein said flattening coating consists of a material selected from the group consisting of positive and negative type photoresists, tetrafluoroethylene, and novolak type resins.
Claim 4
Dependent Claim 29 words
The production method of a thin film magnetic head as defined in claim 1 wherein ion milling, sputter etching or plasma etching is used as said plasma-assisted etching technique.
Claim 5
Dependent Claim 8 words
Product formed by the process of claim 1.
Claim 6
Dependent Claim 30 words
A method as defined in claim 1, including adjusting the etching conditions such that the etching speed of the flattening coating is substantially equal to that of said insulating member.
Claim 7
Dependent Claim 19 words
A method as defined in claim 1, wherein said organic material and said further organic material are different materials.
Claim 8
Dependent Claim 16 words
A method as defined in claim 1 wherein said insulating member is made of polyimide-iso-indroquinazolinedione resin.
Claim 9
Dependent Claim 8 words
Product formed by the process of claim 7.
Claim 10
Dependent Claim 32 words
The production method of a thin film magnetic head as defined in claim 1 wherein said insulating member is an electrically insulating member heat-resistant to a temperature of 300° C. or above.
Claim 11
Dependent Claim 36 words
The production method of a thin film magnetic head as defined in claim 9 wherein said insulating member is a material selected from the group consisting of a polyimide type resin and a maleimide type resin.
Claim 12
Dependent Claim 16 words
A method as defined in claim 10 wherein said insulating member is made of polyimide-iso-indroquinazolinedione resin.
Claim 13
Dependent Claim 8 words
Product formed by the process of claim 11.
Claim 14
Independent Claim 345 words
A method of forming a thin film magnetic head, comprising: forming a lower magnetic film on a substrate; forming coil conductor films on said lower magnetic film, said coil conductor films being insulated from said lower magnetic film, said coil conductor films having a predetermined number of windings; forming an insulating member made of an organic material electrically insulating said coil conductor films from one another and for electrically insulating said coil conductor films from an upper magnetic film to be formed on top of said coil conductor films, said insulating member having a non-uniform surface, wherein a portion of the insulating member on which said upper magnetic film is to be formed has a concavo-convex surface; forming a flattening coating made of a further organic material at least on the portion of said insulating member, having the concavo-convex surface, on which said upper magnetic film is to be formed, said flattening coating having a surface opposed to the surface adjacent said insulating member, said flattening coating having a thickness sufficient such that the opposed surface can be flattened; etching said flattening coating down to said insulating member so as to expose the entire portion of the insulating member on which said upper magnetic film is to be formed, to flatten the surface on which said upper magnetic film is to be formed such that the flattened surface has a height of up to 0.1 μm, said etching being performed by a plasma-assisted etching technique under such a condition where the etching speed of said flattening coating is substantially equal to that of said insulating member; and forming said upper magnetic film on the flattened surface, said upper magnetic film being formed to have one end coming into contact with one end of said lower magnetic film, and to have an end opposite to said one end facing a corresponding end of said lower magnetic film via a magnetic gap, to thereby form a magnetic circuit having a magnetic gap at a part of the upper magnetic film in cooperation with said lower magnetic film.
Claim 15
Independent Claim 345 words
A method of forming a thin film magnetic head, comprising: forming a lower magnetic film on a substrate; forming coil conductor films on said lower magnetic film, said coil conductor films being insulated from said lower magnetic film, said coil conductor films having a predetermined number of windings; forming an insulating member made of an organic material electrically insulating said coil conductor films from one another and for electrically insulating said coil conductor films from an upper magnetic film to be formed on top of said coil conductor films, said insulating member having a non-uniform surface, wherein a portion of the insulating member on which said upper magnetic film is to be formed has a concavo-convex surface; forming a flattening coating made of a further organic material at least on the portion of said insulating member, having the concavo-convex surface, on which said upper magnetic film is to be formed, said flattening coating having a surface opposed to the surface adjacent said insulating member, said flattening coating having a thickness sufficient such that the opposed surface can be flattened; etching said flattening coating down to said insulating member so as to expose the entire portion of the insulating member on which said upper magnetic film is to be formed, to flatten the surface on which said upper magnetic film is to be formed such that the flattened surface has a height of up to 0.1 μm, said etching being performed by a plasma-assisted etching technique under such a condition where the etching speed of said flattening coating is substantially equal to that of said insulating member; and forming said upper magnetic film on the flattened surface, said upper magnetic film being formed to have one end coming into contact with one end of said lower magnetic film, and to have an end opposite to said one end facing a corresponding end of said lower magnetic film via a magnetic gap, to thereby form a magnetic circuit having a magnetic gap at a part of the upper magnetic film in cooperation with said lower magnetic film.
Claim 16
Dependent Claim 23 words
The method as defined in claim 13 wherein said insulating member is made of a material having higher heat resistance than photosensitive resins.
Claim 17
Dependent Claim 27 words
The method as defined in claim 13 wherein said insulating member is made of a material that is thermally stable at temperatures of at least 300° C.
Claim 18
Dependent Claim 28 words
The method as defined in claim 13 wherein said flattening coating is made of a material selected from the group consisting of photoresist, polytetrafluoroethylene, and novolak type resins.
Claim 19
Dependent Claim 63 words
The method as defined in claim 13 wherein, after said etching to form the flattened surface but before said forming said upper magnetic film, the steps of forming said coil conductor films, forming said insulating member, forming said flattening coating, and etching said flattening coating are repeated, to thereby form plural layers of coil conductor films prior to forming the upper magnetic film.
Claim 20
Dependent Claim 30 words
A method as defined in claim 13, including adjusting the etching conditions such that the etching speed of the flattening coating is substantially equal to that of said insulating member.
Claim 21
Dependent Claim 19 words
A method as defined in claim 13, wherein said organic material and said further organic material are different materials.
Claim 22
Dependent Claim 16 words
A method as defined in claim 13 wherein said insulating member is made of polyimide-iso-indroquinazolinedione resin.
Claim 23
Dependent Claim 8 words
Product formed by the process of claim 20.
Claim 24
Dependent Claim 29 words
The method as defined in claim 13, wherein said insulating member is made of a material selected from the group consisting of polyimide type resins and maleimide type resins.
Claim 25
Dependent Claim 28 words
The method as defined in claim 22 wherein said flattening coating is made of a material selected from the group consisting of photoresist, polytetrafluoroethylene, and novolak type resins.
Claim 26
Dependent Claim 16 words
A method as defined in claim 22 wherein said insulating member is made of polyimide-iso-indroquinazolinedione resin.
Claim 27
Dependent Claim 8 words
Product formed by the process of claim 24.

References Cited (Backward Citations)

US4025411A Cited
US4052749A Cited
US4242710A Cited
US4281357A Cited
US4295173A Cited
US4429337A Cited
JPS58124A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1990-08-03 1991-02-02 1991-08-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1994-08-03 1995-02-02 1995-08-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1998-08-03 1999-02-02 1999-08-04 $7700.00 Window Closed / Lapsed

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