Positively working resist material

Claim 1

A positively working resist material consisting essentially of a compound having at least one silyl ether group and an alkali-soluble resin in an amount of from about 30 to about 90% by weight based on the total weight of the resist material, and said compound having at least one silyl ether group is present in an amount sufficient to render the positively working resist material alkali-insoluble but which renders the material alkali-soluble upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam, and said compound is selected from the group consisting of compounds represented by formulae (II), (III), and (IV) ##STR8## wherein R 1 represents a substituted or unsubstituted m-valent aliphatic or aromatic hydrocarbon group; R 2 , R 3 , and R 4 each represents a hydrogen atom, an alkyl group, an alkenyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a halogen atom, or --OR 6 , where R 6 represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted aralkyl group; R 5 and R 7 each represents a substituted or unsubstituted divalent aliphatic or aromatic hydrocarbon residue; or R 5 together with R 6 in R 2 or R 3 form a part of an aliphatic or aromatic ring; R 8 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted acyl group, or ##STR9## m and n each represents a positive integer; and a and b each represents 0 or 1.