US5061684A
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US
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Production of thin layers of a high temperature superconductor (htsc) by a plasma-activated physical vapor deposition process, and cathodes used therein
Assignee: Siemens AG
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Filing: 1989-09-25
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Granted: 1991-10-29
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Expires: 2009-09-25
Abstract
Abstract In the process according to the invention, material is vaporized off a cathode and deposited on a substrate in a cathodic arc vaporization process, the arc base being moved on the cathode surface in a random or controlled manner. In the arc vaporization process, preferably at least two cathodes of different alloys or mixtures of the metallic components of the high temperature superconductor (HTSC) are activated for vaporization by an arc and the materials vaporized out of the different alloys are jointly deposited on the substrate, the arc vaporization process occurring reactivity under oxygen atmosphere of preset O2 partial pressure. A heat treatment for adjusting the structure and oxygen stoichiometry suitable for superconduction can be carried out after or during the vaporizing process.
Inventors
- 👤 Helmut Freller
- 👤 Peter Schack
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 11:39
CPC Classifications
C; C04; C04B; C04B35/00; C04B35/01; C04B35/45; C23; C23C; C23C14/00; C23C14/06; C23C14/08; C23C14/087; C23C14/22; C23C14/24; C23C14/32; C23C14/325; H; H10; H10N; H10N60/00; H10N60/01; H10N60/0268; H10N60/0296; H10N60/0381
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
182 words
A plasma-activated physical vapor deposition process for the production of thin layers of a high temperature superconductor having metallic and oxidic components comprising the steps of removing material from a cathode by a cathodic process, depositing the said material on a substrate, and adjusting the material by a heat treatment to achieve a structure and oxygen stoichiometry suitable for superconduction, wherein the cathodic process is an arc vaporization process with an arc between an anode and the cathode of the material to be removed and with one arc base on said cathode in which the arc base is moved on the cathode surface in a random or a controlled manner, wherein in the arc vaporization process at least two cathodes of different alloys or mixtures of the metallic components of the high temperature superconductor are activated for simultaneous vaporization by an arc for each, and wherein the materials vaporized from the different alloys are jointly deposited on the substrate, the arc vaporization process occurring reactively under an oxygen atmosphere of preset O 2 partial pressure to achieve the oxygen stoichiometry for superconduction.
Claim 2
Dependent Claim
182 words
A plasma-activated physical vapor deposition process for the production of thin layers of a high temperature superconductor having metallic and oxidic components comprising the steps of removing material from a cathode by a cathodic process, depositing the said material on a substrate, and adjusting the material by a heat treatment to achieve a structure and oxygen stoichiometry suitable for superconduction, wherein the cathodic process is an arc vaporization process with an arc between an anode and the cathode of the material to be removed and with one arc base on said cathode in which the arc base is moved on the cathode surface in a random or a controlled manner, wherein in the arc vaporization process at least two cathodes of different alloys or mixtures of the metallic components of the high temperature superconductor are activated for simultaneous vaporization by an arc for each, and wherein the materials vaporized from the different alloys are jointly deposited on the substrate, the arc vaporization process occurring reactively under an oxygen atmosphere of preset O 2 partial pressure to achieve the oxygen stoichiometry for superconduction.
Claim 3
Dependent Claim
19 words
A process according to claim 1, wherein the oxygen partial pressure is from 10 -2 to 10 -1 Pa.
Claim 4
Dependent Claim
16 words
A process according to claim 2, wherein the oxygen partial pressure is about 2×10 -2 Pa.
Claim 5
Dependent Claim
11 words
A process according to claim 1, wherein the substrate is heated.
Claim 6
Dependent Claim
14 words
A process according to claim 4, wherein the substrate is heated to 500° C.
Claim 7
Dependent Claim
23 words
A process according to claim 1, wherein the substrate is symmetrically arranged between the cathodes of the different alloys and is rotated periodically.
Claim 8
Dependent Claim
16 words
A process according to claim 1, wherein a variable accelerating voltage is applied to the substrate.
Claim 9
Dependent Claim
17 words
A process according to claim 7, wherein the variable accelerating voltage is not greater than 1000 V.
Claim 10
Dependent Claim
26 words
A process according to claim 1 for the production of Y-Ba-Cu-O layers, wherein a first cathode of barium-copper and a second cathode of yttrium-copper is used.
Claim 11
Dependent Claim
19 words
A process according to claim 9, wherein the first cathode of barium-copper has a composition between 40:60 and 60:40.
Claim 12
Dependent Claim
19 words
A process according to claim 9, wherein the second cathode of yttrium-copper has a composition between 40:60 and 60:40.
Claim 13
Dependent Claim
26 words
A process according to claim 1 for the production of Bi-Sr-Ca-Cu-O layers, wherein a first cathode of bismuth-strontium and a second cathode of copper-calcium is used.
Claim 14
Dependent Claim
19 words
A process according to claim 12, wherein the first cathode of bismuth-strontium has a composition between 40:60 and 60:40.
Claim 15
Dependent Claim
19 words
A process accoroing to claim 12, wherein the second cathode of copper-calcium has a composition between 80:20 and 50:50.
Claim 16
Dependent Claim
30 words
A process according to claim 1 for the production of Bi-Sr-Ca-Cu-O layers, wherein a first cathode of a bismuth-copper-strontium alloy and a second cathode of a bismuth-copper-calcium alloy is used.
Claim 17
Dependent Claim
19 words
A process according to claim 15, wherein the first cathode of bismuth-copper-strontium has a composition between 15:70:15 and 30:40:30.
Claim 18
Dependent Claim
19 words
A process according to claim 15, wherein the second cathode of bismuth-copper-calcium has a composition between 15:70:15 and 30:40:30.
Claim 19
Dependent Claim
26 words
A process according to claim 15 wherein in at least one of the first cathode and the second cathode the bismuth is partially substituted by lead.
Claim 20
Dependent Claim
34 words
A process according to claim 1 for the production of Tl-Ba-Ca-Cu-O layers, wherein a first cathode of a thallium-barium or thallium-copper-barium alloy and a second cathode of a copper-calcium or thallium-copper-calcium alloy is used.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-10-28 | 1995-04-29 | 1995-10-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-10-28 | 1999-04-29 | 1999-10-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-10-28 | 2003-04-29 | 2003-10-29 | $7700.00 | Window Closed / Lapsed |