Patent US5076877A successfully refreshed from Google Patents.
US5076877A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for dry etching
Assignee: Panasonic Holdings Corp
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Filing: 1990-05-15
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Granted: 1991-12-31
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Expires: 2010-05-15
Abstract
Abstract An apparatus for dry etching, which comprises a stage for supporting a substrate, a rotor having a center shaft, the stage and an arm connecting the stage to the center shaft, and a driving means for turning the rotor at the center shaft as a turning center in the direction tangential to the circumference of a circle established by turning of the surface of the substrate at the center shaft as a turning center, the rotor being housed in a chamber, can make uniform perpendicular submicron etching with radicals or a reactive gas without using ions and without damages on the substrate.
Inventors
- 👤 Tetsuya Ueda
- 👤 Kohsaku Yano
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 12:09
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
114 words
An apparatus for dry etching, comprising: a holder for supporting a substrate; a chamber in which said holder is housed, said chamber including one of radicals and a reactive gas; and a driving means for causing the substrate supported on the holder to move in a circular path around a given center such that a vector normal to the main surface of the substrate moves in a direction tangential to the circumference of said circular path established by movement of the substrate around said given center and such that kinetic energy is imparted to said radicals or said reactive gas in the chamber by the movement of the substrate, thereby anisotropically etching the substrate.
Claim 2
Independent Claim
114 words
An apparatus for dry etching, comprising: a holder for supporting a substrate; a chamber in which said holder is housed, said chamber including one of radicals and a reactive gas; and a driving means for causing the substrate supported on the holder to move in a circular path around a given center such that a vector normal to the main surface of the substrate moves in a direction tangential to the circumference of said circular path established by movement of the substrate around said given center and such that kinetic energy is imparted to said radicals or said reactive gas in the chamber by the movement of the substrate, thereby anisotropically etching the substrate.
Claim 3
Independent Claim
131 words
An apparatus for dry etching, comprising: a rotor including a holder for supporting a substrate, said holder including an arm for securing said substrate, said rotor being turnable around a center shaft; a chamber for housing said rotor, said chamber including one of radicals and a reactive gas; and a driving means for causing the substrate supported on the holder to move in a circular path around said center shaft, such that a normal to the main surface of the substrate moves in a direction tangential to the circumference of said circular path established by movement of the substrate around said center shaft and such that kinetic energy is imparted to said radials or said reactive gas in the chamber by the movement of the substrate, thereby anisotropically etching the substrate.
Claim 4
Independent Claim
131 words
An apparatus for dry etching, comprising: a rotor including a holder for supporting a substrate, said holder including an arm for securing said substrate, said rotor being turnable around a center shaft; a chamber for housing said rotor, said chamber including one of radicals and a reactive gas; and a driving means for causing the substrate supported on the holder to move in a circular path around said center shaft, such that a normal to the main surface of the substrate moves in a direction tangential to the circumference of said circular path established by movement of the substrate around said center shaft and such that kinetic energy is imparted to said radials or said reactive gas in the chamber by the movement of the substrate, thereby anisotropically etching the substrate.
Claim 5
Dependent Claim
23 words
An apparatus according to claim 2, wherein the chamber is provided with an exhaust means for evacuating the chamber and a gas-injecting means.
Claim 6
Dependent Claim
24 words
An apparatus according to claim 3, wherein the gas-injecting means has a means for introducing a reactive gas to a substrate to be etched.
Claim 7
Dependent Claim
27 words
An apparatus according to claim 3, wherein the gas-injecting means has a means for selecting only radicals from a plasma and feeding the radicals into the chamber.
Claim 8
Dependent Claim
15 words
An apparatus according to claim 3, wherein the reactive gas is a fluorine compound gas.
Claim 9
Dependent Claim
21 words
An apparatus according to claim 3, wherein a plurality of said holders for supporting a plurality of said substrates are provided.
Claim 10
Dependent Claim
17 words
An apparatus according to claim 3, wherein the chamber has a cooling means for cooling the chamber.
References Cited (Backward Citations)
US4528438A
Cited
US4307283A
Cited
US4624214A
Cited
JPS60184679A
Cited
JPS60249328A
Cited
US4615756A
Cited
JPS62243785A
Cited
US4788994A
Cited
JPS6383286A
Cited
JPS648624A
Cited
US4950376A
Cited
US4961812A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-12-30 | 1995-07-01 | 1995-12-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-12-30 | 1999-07-01 | 1999-12-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-12-30 | 2003-07-01 | 2003-12-31 | $7700.00 | Window Closed / Lapsed |