US5124228A
Expired / Lapsed
US
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Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester
Assignee: Sumitomo Chemical Co Ltd
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Filing: 1989-07-18
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Granted: 1992-06-23
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Expires: 2009-07-18
Abstract
Abstract A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I) or (II): ##STR1## wherein a, c and d are the same or different and a number of 0 to 3, provided that when a is 0 or 3, b is a number of 0 to 3 or when a is 1 or 2, b is 0, 1 or 2, and a+b and c+d are not less than 2; R and R' are the same or different and an alkyl group or an aryl group provides a positive resist composition having a high γ-value.
Inventors
- 👤 Yasunori Uetani
- 👤 Makoto Hanabata
- 👤 Hirotoshi Nakanishi
- 👤 Koji Kuwana
- 👤 Fumio Oi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 14:12
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/72; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
164 words
A positive photoresist composition which comprises an alkali-soluble resin in admixture with a photosensitive compound comprising at least one o-quinone diazide sulfonic acid ester of a phenol compound of the general formula (I) or (II): ##STR6## wherein a, c and d are the same or different and a number of 0 to 3, provided that when a is 0 or 3, b is a number of 0 to 3 or when a is 1 to 2, b is 0, 1 or 2, and both the sums a+b and c+d each are 2-4; R and R' are the same or different each is an alkyl group, wherein the o-quinone diazide sulfonic acid ester is present in an amount of from 15 to 50% by weight based on the total weight of the solid components in the photoresist composition wherein said o-quinone diazide sulfonic acid ester is prepared from a condensation reaction of the phenol compound with naphthoquinone diazide sulfonyl halogenide or benzoquinone diazide sulfonyl halogenide.
Claim 2
Dependent Claim
164 words
A positive photoresist composition which comprises an alkali-soluble resin in admixture with a photosensitive compound comprising at least one o-quinone diazide sulfonic acid ester of a phenol compound of the general formula (I) or (II): ##STR6## wherein a, c and d are the same or different and a number of 0 to 3, provided that when a is 0 or 3, b is a number of 0 to 3 or when a is 1 to 2, b is 0, 1 or 2, and both the sums a+b and c+d each are 2-4; R and R' are the same or different each is an alkyl group, wherein the o-quinone diazide sulfonic acid ester is present in an amount of from 15 to 50% by weight based on the total weight of the solid components in the photoresist composition wherein said o-quinone diazide sulfonic acid ester is prepared from a condensation reaction of the phenol compound with naphthoquinone diazide sulfonyl halogenide or benzoquinone diazide sulfonyl halogenide.
Claim 3
Dependent Claim
23 words
The positive photoresist composition according to claim 1, wherein the phenol compound is at least one selected from the group consisting of ##STR7##
Claim 4
Dependent Claim
14 words
The positive photoresist composition according to claim 1, wherein the phenol compound is ##STR8##
Claim 5
Dependent Claim
14 words
The positive photoresist composition according to claim 1, wherein the phenol compound is ##STR9##
Claim 6
Dependent Claim
14 words
The positive photoresist composition according to claim 1, wherein the phenol compound is ##STR10##
Claim 7
Dependent Claim
14 words
The positive photoresist composition according to claim 1, wherein the phenol compound is ##STR11##
Claim 8
Dependent Claim
18 words
The positive photoresist composition according to claim 1, wherein the phenol compound is that of the formula (I).
Claim 9
Dependent Claim
17 words
The positive photoresist composition according to claim 1, wherein the phenol compound is that of formula (II).
Claim 10
Dependent Claim
21 words
The positive photoresist composition according to claim 1, wherein R and R' are each independently C 16 -C 4 alkyl groups.
Claim 11
Dependent Claim
18 words
The positive photoresist composition according to claim 1, wherein R is a C 1 -C 4 alkyl group.
Claim 12
Dependent Claim
21 words
The positive photoresist composition according to claim 8, wherein R and R' are each independently C 1 -C 4 alkyl groups.
Claim 13
Dependent Claim
43 words
The positive photoresist composition according to claim 1, wherein said o-quinone diazide sulfonic acid ester is prepared from a condensation reaction of the phenol compound with a diazide sulfonyl halogenide selected from the group consisting of naphthoquinone-(1,2)-diazide-(2)-5-sulfonyl chloride, naphthoquinone-(1,2)-diazide-(2)-4-sulfonyl chloride, and benzoquinone-(1,2)-diazide-(2)-4-sulfonyl chloride.
Claim 14
Dependent Claim
43 words
The positive photoresist composition according to claim 1, wherein said composition further includes at least one o-quinone diazide sulfonic acid ester of a phenol compound selected from the group consisting of hydroquinone, resorcinol, phloroglucin, 2,4-dihydroxybenzophenone, 2,3,4-trihydroxybenzophenone, 2,3,3',4-tetrahydroxybenzophenone, 2,3,4,4'-tetrahydroxybenzophenone, 2,2',3,3',4-pentahydroxybenzophenone, 2,3,3',4,5'-pentahydroxybenzophenone, and alkyl gallates.
Claim 15
Dependent Claim
45 words
The positive photoresist composition according to claim 1, wherein the alkali-soluble resin is a novolak resin prepared by an addition condensation reaction of formaldehyde and at least one phenol selected from the group consisting of phenol, cresol, xylenol, ethylphenol, trimethylphenol, propylphenol, butylphenol, dihydroxybenzene, and naphthols.
Claim 16
Dependent Claim
16 words
The positive photoresist composition according to claim 1, wherein the alkali-soluble resin is a novolak resin.
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US4626492A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-06-23 | 1995-12-23 | 1996-06-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-06-23 | 1999-12-23 | 2000-06-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-06-23 | 2003-12-23 | 2004-06-23 | $7700.00 | Window Closed / Lapsed |