US5226967A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber
Assignee: Lam Research Corp
•
Filing: 1992-05-14
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Granted: 1993-07-13
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Expires: 2012-05-14
Abstract
Abstract An apparatus for plasma etching or plasma deposition including a housing having a chamber in which a wafer can be treated with plasma. The housing includes at least one inlet port connected to an interior of the chamber through which process gas can be supplied to the chamber. A radiofrequency energy source is arranged to pass radiofrequency energy into the chamber and induce plasma in the interior of the chamber by activating, with an electric field induced by the radiofrequency energy source, process gas supplied to the chamber through the inlet port. A dielectric window having an inner surface thereof forms part of an inner wall of the chamber. Radiofrequency energy passes from the radiofrequency energy source to the interior of the chamber through the dielectric window. The dielectric window has a thickness which varies at different points along the inner surface thereof such that the thickness is largest at a central portion of the dielectric window. The dielectric window is effective to decrease the induced electric field in the interior of the chamber near the central portion of the dielectric window.
Inventors
- 👤 Ching-Hwa Chen
- 👤 David Liu
- 👤 Duc Tran
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 14:09
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/32238; H01J37/32082; H01J37/321; H01J37/32119; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/507; C23C16/513; H01J37/32431; H01J37/32532; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
203 words
An apparatus for plasma etching or plasma deposition, comprising: a housing having a chamber in which a wafer can be treated with plasma, the housing including at least one inlet port connected to an interior of the chamber through which process gas can be supplied to the chamber; a radiofrequency energy source comprising a plasma generating electrode arranged to pass radiofrequency energy into the chamber and induce plasma in the interior of the chamber by activating, with an electric field induced by the radiofrequency energy source, process gas supplied to the chamber through the inlet port the plasma generating electrode inducing a flow of electrons within a planar region in the chamber; and a dielectric window having an inner surface thereof forming part of an inner wall of the chamber, radiofrequency energy passing from the radiofrequency energy source to the interior of the chamber through the dielectric window, the dielectric window having a thickness which varies at different points along the inner surface thereof such that the thickness is largest at a central portion of the dielectric window, the dielectric window being effective to decrease the induced electric field in the interior of the chamber near the central portion of the dielectric window.
Claim 2
Independent Claim
203 words
An apparatus for plasma etching or plasma deposition, comprising: a housing having a chamber in which a wafer can be treated with plasma, the housing including at least one inlet port connected to an interior of the chamber through which process gas can be supplied to the chamber; a radiofrequency energy source comprising a plasma generating electrode arranged to pass radiofrequency energy into the chamber and induce plasma in the interior of the chamber by activating, with an electric field induced by the radiofrequency energy source, process gas supplied to the chamber through the inlet port the plasma generating electrode inducing a flow of electrons within a planar region in the chamber; and a dielectric window having an inner surface thereof forming part of an inner wall of the chamber, radiofrequency energy passing from the radiofrequency energy source to the interior of the chamber through the dielectric window, the dielectric window having a thickness which varies at different points along the inner surface thereof such that the thickness is largest at a central portion of the dielectric window, the dielectric window being effective to decrease the induced electric field in the interior of the chamber near the central portion of the dielectric window.
Claim 3
Dependent Claim
40 words
An apparatus for plasma etching or plasma deposition as set forth in claim 1, wherein the radiofrequency energy source comprises a substantially planar plasma generating electrode having one planar face thereof facing an outer planar surface of the dielectric window.
Claim 4
Dependent Claim
26 words
An apparatus for plasma etching or plasma deposition as set forth in claim 1, wherein the dielectric window comprises a plurality of layers of dielectric material.
Claim 5
Dependent Claim
50 words
An apparatus for plasma etching or plasma deposition as set forth in claim 3, wherein the dielectric window comprises a first layer of dielectric material laminated to a second layer of dielectric material, the second layer having an outer periphery spaced inwardly of an outer periphery of the first layer.
Claim 6
Dependent Claim
48 words
An apparatus for plasma etching or plasma deposition as set forth in claim 4, wherein the dielectric window further comprises a third layer of dielectric material laminated to the second layer, the third layer having an outer periphery spaced inwardly of the outer periphery of the second layer.
Claim 7
Dependent Claim
23 words
An apparatus for plasma etching or plasma deposition as set forth in claim 1, wherein one side of the dielectric window is flat.
Claim 8
Dependent Claim
30 words
An apparatus for plasma etching or plasma deposition as set forth in claim 6, wherein the flat side of the dielectric window is an outer surface of the dielectric window.
Claim 9
Dependent Claim
23 words
An apparatus for plasma etching or plasma deposition as set forth in claim 1, wherein the dielectric window is substantially circular in shape.
Claim 10
Dependent Claim
39 words
An apparatus for plasma etching or plasma deposition as set forth in claim 1, wherein the dielectric window includes at least one step therein such that the dielectric window has a region of reduced thickness surrounding the central portion.
Claim 11
Dependent Claim
28 words
An apparatus for plasma etching or plasma deposition as set forth in claim 1, wherein the dielectric window includes at least one tapered surface surrounding the central portion.
Claim 12
Dependent Claim
26 words
An apparatus for plasma etching or plasma deposition as set forth in claim 1, wherein the inner surface of the dielectric window is convex in shape.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-07-12 | 1997-01-11 | 1997-07-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-07-12 | 2001-01-11 | 2001-07-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-07-12 | 2005-01-11 | 2005-07-13 | $7700.00 | Window Closed / Lapsed |