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US5286331A Expired / Lapsed US ⏱️ 0.0 years remaining

Supersonic molecular beam etching of surfaces

Assignee: International Business Machines Corp
•
Filing: 1991-11-01
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Granted: 1994-02-15
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Expires: 2011-11-01
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Abstract

Abstract In supersonic molecular beam etching, the reactivity of the etchant gas and substrate surface is improved by creating etchant gas molecules with high internal energies through chemical reactions of precursor molecules, forming clusters of etchant gas molecules in a reaction chamber, expanding the etchant gas molecules and clusters of etchant gas molecules through a nozzle into a vacuum, and directing the molecules and clusters of molecules onto a substrate. Translational energy of the molecules and clusters of molecules can be improved by seeding with inert gas molecules. The process provides improved controllability, surface purity, etch selectivity and anisotropy. Etchant molecules may also be expanded directly (without reaction in a chamber) to produce clusters whose translational energy can be increased through expansion with a seeding gas.

Inventors

  • 👤 Lee Chen
  • 👤 Shwu-Jen Jeng
  • 👤 Wesley C. Natzle
  • 👤 Chienfan Yu

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 06:01
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; C; C23; C23F; C23F4/00

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 99 words
An apparatus for etching a substrate, comprising: an enclosure; means for maintaining said enclosure at a subatmospheric pressure; a nozzle assembly for generating a supersonic molecular beam from reactant molecules expanded through at least one nozzle in said nozzle assembly into said enclosure; means for controlling an energy parameter of said supersonic molecular beam associated with said nozzle assembly; and means for supporting a substrate in a path of said supersonic molecular beam, wherein a reaction if formed by an interaction between said reactant molecules devoid of external activation, a product of said reaction being reactive with said substrate.
Claim 2
Independent Claim 99 words
An apparatus for etching a substrate, comprising: an enclosure; means for maintaining said enclosure at a subatmospheric pressure; a nozzle assembly for generating a supersonic molecular beam from reactant molecules expanded through at least one nozzle in said nozzle assembly into said enclosure; means for controlling an energy parameter of said supersonic molecular beam associated with said nozzle assembly; and means for supporting a substrate in a path of said supersonic molecular beam, wherein a reaction if formed by an interaction between said reactant molecules devoid of external activation, a product of said reaction being reactive with said substrate.
Claim 3
Dependent Claim 34 words
An apparatus as recited in claim 1 wherein said means for controlling includes a chamber associated with said nozzle assembly including means for creating said reactant molecules at said nozzle assembly from precursor gases.
Claim 4
Dependent Claim 48 words
An apparatus as recited in claim 1 wherein said means for controlling comprises means for introducing a source of non-reactive molecules into said nozzle assembly and a nozzle in said nozzle assembly positioned for allowing said non-reactive molecules to be co-expanded through said nozzle with said reactant molecules.
Claim 5
Dependent Claim 16 words
An apparatus as recited in claim 1 wherein said nozzle assembly includes more than one nozzle.

References Cited (Backward Citations)

US4788082A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-02-14 1997-08-16 1998-02-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-02-14 2001-08-16 2002-02-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-02-14 2005-08-16 2006-02-15 $7700.00 Window Closed / Lapsed

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