US5312778A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for plasma processing using magnetically enhanced plasma chemical vapor deposition
Assignee: Applied Materials Inc
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Filing: 1990-11-23
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Granted: 1994-05-17
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Expires: 2010-11-23
Abstract
Abstract A method for plasma processing characterized by the steps of disposing a wafer proximate to a cathode within a process chamber, releasing a gas into the chamber, applying R.F. power in the VHF/UHF frequency range to the cathode to form a plasma within the chamber, developing a magnetic field within the chamber having flux lines substantially perpendicular to the surface of the wafer, and varying the strength of the magnetic field until a desired cathode sheath voltage is attained. The apparatus includes a chamber, a wafer-supporting cathode disposed within the chamber, a mechanism for introducing gas into the chamber, an R.F. power source coupled to the cathode operating in the frequency from about 50-800 megahertz, an electromagnetic coil disposed around the chamber adapted to develop a magnetic field within the chamber which is substantially perpendicular to the wafer and a variable output power supply coupled to the coil to vary the magnetic field strength and therefore the cathode sheath voltage within the chamber.
Inventors
- 👤 Kenneth S. Collins
- 👤 Chan-Lon Yang
- 👤 John M. White
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 03:36
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; H01J37/32091; H01J37/32174; H01J37/32431; H01J37/32623; H05; H05H; H05H1/00; H05H1/24; H05H1/46
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
149 words
A method for forming a plasma comprising: providing a gas; coupling radio frequency energy into said gas through a cathode to form a plasma having a substantially electrically neutral body portion comprising positive ions of said gas and free electrons, said plasma further having an electron-depleted sheath portion proximate to said cathode, said sheath portion having an electrical potential; developing a magnetic field within said plasma, wherein the cathode has a surface for supporting a workpiece adjacent to the sheath portion of the plasma, and wherein flux lines of the magnetic field proximate to the surface of the cathode are substantially perpendicular to at least a portion of the surface of the cathode; and varying the strength of said magnetic field to vary the electric potential of said sheath portion, where said electric potential is inversely related to said strength of said magnetic field within a desired operating range.
Claim 2
Independent Claim
149 words
A method for forming a plasma comprising: providing a gas; coupling radio frequency energy into said gas through a cathode to form a plasma having a substantially electrically neutral body portion comprising positive ions of said gas and free electrons, said plasma further having an electron-depleted sheath portion proximate to said cathode, said sheath portion having an electrical potential; developing a magnetic field within said plasma, wherein the cathode has a surface for supporting a workpiece adjacent to the sheath portion of the plasma, and wherein flux lines of the magnetic field proximate to the surface of the cathode are substantially perpendicular to at least a portion of the surface of the cathode; and varying the strength of said magnetic field to vary the electric potential of said sheath portion, where said electric potential is inversely related to said strength of said magnetic field within a desired operating range.
Claim 3
Dependent Claim
28 words
A method for forming a plasma as recited in claim 1 wherein said radio frequency energy has a frequency in the range of 50 megahertz to 800 megahertz.
Claim 4
Independent Claim
185 words
A method for developing a range of cathode sheath voltages in a plasma processing machine comprising: determining a cathode sheath voltage upper limit for a plasma processing machine; releasing a process gas proximate a cathode of said plasma processing machine, said cathode being provided with a surface adapted to support a wafer and having an axis which is substantially normal to at least a portion of said surface; applying radio-frequency power to said cathode to form a plasma from said gas and to develop a cathode sheath proximate said surface of said cathode, where said radio-frequency is chosen such that cathode sheath voltage is no higher than said upper limit; developing a magnetic field within said plasma having flux lines which are substantially parallel to said axis of said cathode proximate to said surface of said cathode; and varying the strength of said magnetic field to vary said cathode sheath voltage from a maximum no greater than said upper limit when said magnetic field strength is at a minimum to a cathode sheath voltage lower limit when said magnetic field strength is at a maximum.
Claim 5
Independent Claim
185 words
A method for developing a range of cathode sheath voltages in a plasma processing machine comprising: determining a cathode sheath voltage upper limit for a plasma processing machine; releasing a process gas proximate a cathode of said plasma processing machine, said cathode being provided with a surface adapted to support a wafer and having an axis which is substantially normal to at least a portion of said surface; applying radio-frequency power to said cathode to form a plasma from said gas and to develop a cathode sheath proximate said surface of said cathode, where said radio-frequency is chosen such that cathode sheath voltage is no higher than said upper limit; developing a magnetic field within said plasma having flux lines which are substantially parallel to said axis of said cathode proximate to said surface of said cathode; and varying the strength of said magnetic field to vary said cathode sheath voltage from a maximum no greater than said upper limit when said magnetic field strength is at a minimum to a cathode sheath voltage lower limit when said magnetic field strength is at a maximum.
Claim 6
Dependent Claim
23 words
A method as recited in claim 3 wherein said radio-frequency is a fixed frequency within the range of 50 megahertz to 800 megahertz.
Claim 7
Dependent Claim
23 words
A method as recited in claim 4 wherein said upper limit is about 500 volts and said lower limit is about 50 volts.
Claim 8
Independent Claim
105 words
A method for plasma processing a wafer within a chamber comprising: disposing a wafer proximate to a cathode within a processing chamber; releasing a process gas into said chamber; applying radio frequency power having a frequency in the range from about 50 megahertz to about 800 megahertz to said cathode sufficient to create a plasma within said chamber and to develop a cathode sheath proximate to said cathode; developing a magnetic field within said chamber having flux lines which are substantially perpendicular to a surface of said wafer; and varying the strength of said magnetic field until a desired cathode sheath voltage level is attained.
Claim 9
Independent Claim
105 words
A method for plasma processing a wafer within a chamber comprising: disposing a wafer proximate to a cathode within a processing chamber; releasing a process gas into said chamber; applying radio frequency power having a frequency in the range from about 50 megahertz to about 800 megahertz to said cathode sufficient to create a plasma within said chamber and to develop a cathode sheath proximate to said cathode; developing a magnetic field within said chamber having flux lines which are substantially perpendicular to a surface of said wafer; and varying the strength of said magnetic field until a desired cathode sheath voltage level is attained.
Claim 10
Dependent Claim
23 words
A method as recited in claim 6 wherein said processing gas is an etchant gas at a pressure less than about 500 millitorr.
Claim 11
Independent Claim
16 words
A method as recited in 6 wherein said magnetic field is developed by electromagnetic coil means.
Claim 12
Independent Claim
16 words
A method as recited in 6 wherein said magnetic field is developed by electromagnetic coil means.
Claim 13
Dependent Claim
22 words
A method as recited in claim 8 wherein said electromagnetic coil means includes a pair of coils having a common magnetic axis.
Claim 14
Dependent Claim
21 words
A method as recited in claim 9 wherein said pair of electromagnetic coils develop magnetic fields which are of opposing polarities.
Claim 15
Dependent Claim
20 words
A method as recited in claim 9 wherein said pair of electromagnetic coils develop magnetic fields of the aiding polarities.
Claim 16
Dependent Claim
18 words
A method as recited in claim 9 wherein said pair of coils are arranged in a Helmholtz configuration.
Claim 17
Dependent Claim
27 words
A method as recited in claim 8 wherein said strength of said magnetic field is varied by varying an electric current supplied to said electromagnetic coil means.
Claim 18
Dependent Claim
21 words
A method as recited in claim 7 wherein said magnetic field is developed, at least in part, by permanent magnet means.
Claim 19
Dependent Claim
30 words
A method as recited in claim 14 wherein said at least a portion of said permanent magnet means is replaceable in order to vary said strength of said magnetic field.
References Cited (Backward Citations)
US3860507A
Cited
US4369205A
Cited
JPS57208125A
Cited
US4521286A
Cited
US4526643A
Cited
US4808258A
Cited
JPS60176224A
Cited
JPS6126597A
Cited
US4572759A
Cited
US4623417A
Cited
US4632719A
Cited
US4673589A
Cited
US4874494A
Cited
US4776918A
Cited
US4842683A
Cited
EP0272142A2
Cited
US4761219A
Cited
JPS6485915A
Cited
EP0326405A2
Cited
US5011705A
Cited
EP0343017A2
Cited
US4891095A
Cited
JPH0237117A
Cited
EP0396919A2
Cited
EP0421430A2
Cited
JPH03146661A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-05-16 | 1997-11-15 | 1998-05-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-05-16 | 2001-11-15 | 2002-05-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-05-16 | 2005-11-15 | 2006-05-17 | $7700.00 | Window Closed / Lapsed |