US5438022A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for using low dielectric constant material in integrated circuit fabrication
Assignee: MagnaChip Semiconductor Ltd
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Filing: 1993-12-14
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Granted: 1995-08-01
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Expires: 2013-12-14
Abstract
Abstract A low dielectric material is applied, as by spinning on, over the passivation layer of a semiconductor chip to fill the gaps which may exist between the top layer metal lines, and thereby minimize the possibility of cross talk which might otherwise be present between those lines.
Inventors
- 👤 Derryl D. J. Allman
- 👤 Kenneth P. Fuchs
- 👤 Gayle W. Miller
- 👤 Samuel C. Gioia
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 05:37
CPC Classifications
H; H10; H10W; H10W74/00; H10W74/10; H10W74/131; H10W74/137; H10W20/00; H10W20/40; H10W20/495
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
74 words
A method of producing an integrated circuit device in which cross talk between metal lines is reduced, comprising the following steps: (a) providing a integrated circuit device having a plurality of metal interconnect lines and a passivation layer disposed thereover; (b) applying a low dielectric constant material over said passivation layer, in which the low dielectric constant material comprises polyimide; and (c) applying a high dielectric constant material over said low dielectric constant material.
Claim 2
Independent Claim
74 words
A method of producing an integrated circuit device in which cross talk between metal lines is reduced, comprising the following steps: (a) providing a integrated circuit device having a plurality of metal interconnect lines and a passivation layer disposed thereover; (b) applying a low dielectric constant material over said passivation layer, in which the low dielectric constant material comprises polyimide; and (c) applying a high dielectric constant material over said low dielectric constant material.
Claim 3
Independent Claim
74 words
A method of producing an integrated circuit device in which cross talk between metal lines is reduced, comprising the following steps: (a) providing a integrated circuit device having a plurality of metal interconnect lines and a passivation layer disposed thereover; (b) applying a low dielectric constant material over said passivation layer, in which the low dielectric constant material comprises Teflon; and (c) applying a high dielectric constant material over said low dielectric constant material.
Claim 4
Independent Claim
74 words
A method of producing an integrated circuit device in which cross talk between metal lines is reduced, comprising the following steps: (a) providing a integrated circuit device having a plurality of metal interconnect lines and a passivation layer disposed thereover; (b) applying a low dielectric constant material over said passivation layer, in which the low dielectric constant material comprises Teflon; and (c) applying a high dielectric constant material over said low dielectric constant material.
Claim 5
Independent Claim
83 words
A method of reducing cross talk in an integrated circuit device having a plurality of metal interconnect lines and a passivation layer disposed thereover, comprising the steps of applying a low dielectric constant material over said passivation layer and applying a high dielectric constant material over said low dielectric constant material, in which the step of applying a low dielectric constant material comprises spinning said low dielectric constant material over said passivation layer, and in which said low dielectric constant material comprises polyimide.
Claim 6
Independent Claim
83 words
A method of reducing cross talk in an integrated circuit device having a plurality of metal interconnect lines and a passivation layer disposed thereover, comprising the steps of applying a low dielectric constant material over said passivation layer and applying a high dielectric constant material over said low dielectric constant material, in which the step of applying a low dielectric constant material comprises spinning said low dielectric constant material over said passivation layer, and in which said low dielectric constant material comprises polyimide.
Claim 7
Independent Claim
83 words
A method of reducing cross talk in an integrated circuit device having a plurality of metal interconnect lines and a passivation layer disposed thereover, comprising the steps of applying a low dielectric constant material over said passivation layer and applying a high dielectric constant material over said low dielectric constant material, in which the step of applying a low dielectric constant material comprises spinning said low dielectric constant material over said passivation layer, and in which said low dielectric constant material comprises Teflon.
Claim 8
Independent Claim
83 words
A method of reducing cross talk in an integrated circuit device having a plurality of metal interconnect lines and a passivation layer disposed thereover, comprising the steps of applying a low dielectric constant material over said passivation layer and applying a high dielectric constant material over said low dielectric constant material, in which the step of applying a low dielectric constant material comprises spinning said low dielectric constant material over said passivation layer, and in which said low dielectric constant material comprises Teflon.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-07-31 | 1999-01-30 | 1999-08-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-07-31 | 2003-01-30 | 2003-08-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-07-31 | 2007-01-30 | 2007-08-01 | $7700.00 | Window Closed / Lapsed |