Patent US5356686A successfully refreshed from Google Patents.
US5356686A
Expired / Lapsed
US
⏱️ 0.0 years remaining
X-ray mask structure
Assignee: Canon Inc
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Filing: 1994-01-14
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Granted: 1994-10-18
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Expires: 2014-01-14
Abstract
Abstract An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is formed in at least one of the mask substrate and the supporting frame.
Inventors
- 👤 Hidehiko Fujioka
- 👤 Takeshi Miyachi
- 👤 Yasuaki Fukuda
- 👤 Yuji Chiba
- 👤 Nobutoshi Mizusawa
- 👤 Takao Kariya
- 👤 Shunichi Uzawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 05:40
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/22; G03F7/00; G03F7/70; G03F7/708; G03F7/70858; G03F7/70866; Y; Y10; Y10T; Y10T428/00; Y10T428/21; Y10T428/24; Y10T428/24479; Y10T428/24612; Y10T428/24802; Y10T428/24851
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
108 words
An X-ray mask structure, comprising: a mask substrate having a pattern; a supporting frame carrying and supporting said mask substrate; a plurality of fixing means provided at different positions, each of said fixing means fixing said mask substrate to said supporting frame through an adhesive material; and stress releasing groove means provided in at least one of said mask substrate and said supporting frame, wherein said groove means is so disposed as to be free from receiving any portion of the adhesive material, and each of said fixing means is substantially surrounded by a corresponding portion of said groove means to substantially isolate each of said fixing means.
Claim 2
Dependent Claim
108 words
An X-ray mask structure, comprising: a mask substrate having a pattern; a supporting frame carrying and supporting said mask substrate; a plurality of fixing means provided at different positions, each of said fixing means fixing said mask substrate to said supporting frame through an adhesive material; and stress releasing groove means provided in at least one of said mask substrate and said supporting frame, wherein said groove means is so disposed as to be free from receiving any portion of the adhesive material, and each of said fixing means is substantially surrounded by a corresponding portion of said groove means to substantially isolate each of said fixing means.
Claim 3
Dependent Claim
37 words
An X-ray mask structure according to claim 1, wherein said stress releasing groove means absorbs strain of said mask substrate or said supporting frame due to thermal stress or stress resulting from contraction of said adhesive material.
Claim 4
Dependent Claim
47 words
An X-ray mask structure according to claim 1, wherein said stress releasing groove means divides a portion of the surface of said supporting frame to which said adhesive material is applied, from a portion of said supporting frame surface to which said adhesive material is not applied.
Claim 5
Dependent Claim
38 words
An X-ray mask structure according to claim 1, wherein said supporting frame has a ring-like shape and wherein said stress releasing groove means is formed in a ring-like shape, concentric with the ring-like shape of said supporting frame.
Claim 6
Dependent Claim
111 words
An X-ray mask for manufacturing a semiconductor device, comprising: a mask substrate having a circuit pattern; a supporting frame carrying and supporting said mask substrate; a plurality of fixing means provided at different positions, each of said fixing means fixing said mask substrate to said supporting frame; and stress releasing groove means provided in at least one of said mask substrate and said supporting frame, wherein said stress releasing groove means is so disposed as to be free from receiving any portion of the adhesive material, and each of said fixing means is substantially surrounded by a corresponding portion of said groove means to substantially isolate each of said fixing means.
Claim 7
Dependent Claim
111 words
An X-ray mask for manufacturing a semiconductor device, comprising: a mask substrate having a circuit pattern; a supporting frame carrying and supporting said mask substrate; a plurality of fixing means provided at different positions, each of said fixing means fixing said mask substrate to said supporting frame; and stress releasing groove means provided in at least one of said mask substrate and said supporting frame, wherein said stress releasing groove means is so disposed as to be free from receiving any portion of the adhesive material, and each of said fixing means is substantially surrounded by a corresponding portion of said groove means to substantially isolate each of said fixing means.
Claim 8
Dependent Claim
98 words
An X-ray mask structure, comprising: a mask substrate having a pattern; a supporting frame supporting said mask substrate; fixing means fixing said mask substrate to said supporting frame through an adhesive material; and stress releasing groove means provided in at least one of said mask substrate and said supporting frame, wherein said groove means is so disposed as to be free from receiving any portion of the adhesive material, and said groove means is defined in a substantially ring-like shape and is disposed radially outwardly of the adhesive material with respect to the center of said mask substrate.
Claim 9
Dependent Claim
98 words
An X-ray mask structure, comprising: a mask substrate having a pattern; a supporting frame supporting said mask substrate; fixing means fixing said mask substrate to said supporting frame through an adhesive material; and stress releasing groove means provided in at least one of said mask substrate and said supporting frame, wherein said groove means is so disposed as to be free from receiving any portion of the adhesive material, and said groove means is defined in a substantially ring-like shape and is disposed radially outwardly of the adhesive material with respect to the center of said mask substrate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-10-17 | 1998-04-18 | 1998-10-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-10-17 | 2002-04-18 | 2002-10-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-10-17 | 2006-04-18 | 2006-10-18 | $7700.00 | Window Closed / Lapsed |