US6842229B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Imprint lithography template comprising alignment marks
Assignee: The University of Texas System
•
Filing: 2003-12-29
•
Granted: 2005-01-11
•
Expires: 2023-12-29
Abstract
Abstract A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
Inventors
- 👤 Sidlgata V. Sreenivasan
- 👤 Byung J. Choi
- 👤 Matthew Colburn
- 👤 Todd Bailey
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 19:04
CPC Classifications
B; B29; B29C; B29C35/00; B29C35/02; B29C35/08; B29C35/0888; B29C37/00; B29C37/005; B29C37/0053; B29C43/00; B29C43/003; B29C43/02; B29C43/021; B82; B82Y; B82Y10/00; B82Y40/00; G; G03; G03F; G03F7/00; G03F7/0002; G03F9/00; B29C35/0805; B29C2035/0827; B29C2043/023; B29C2043/025; Y; Y10; Y10S; Y10S101/00; Y10S101/36; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
47 words
An imprint lithography template, said template comprising: template alignment marks that are substantially transparent to a first flux of light and that produce an analyzable mark in response to a second flux of light with said first flux of light differing from said second flux of light.
Claim 2
Dependent Claim
47 words
An imprint lithography template, said template comprising: template alignment marks that are substantially transparent to a first flux of light and that produce an analyzable mark in response to a second flux of light with said first flux of light differing from said second flux of light.
Claim 3
Dependent Claim
17 words
The template as recited in claim 1 , wherein said first flux of light includes ultraviolet light.
Claim 4
Dependent Claim
17 words
The template as recited in claim 1 , wherein said second flux of light includes visible light.
Claim 5
Dependent Claim
21 words
The template as recited in claim 1 , wherein said template alignment marks comprise SiO x with x less than 2.
Claim 6
Dependent Claim
20 words
The template as recited in claim 1 , wherein said template alignment marks comprise SiO x with x approximately 1.5.
Claim 7
Dependent Claim
20 words
The template as recited in claim 1 , wherein said template is substantially transparent to said first flux of light.
Claim 8
Dependent Claim
20 words
The template as recited in claim 1 , wherein said template is substantially transparent to said second flux of light.
Claim 9
Dependent Claim
51 words
An imprint lithography template, said template comprising: template alignment marks, with said template substantially transparent to a first flux of light and said template alignment marks producing an analyzable mark in response to a second flux of light with said first flux of light differing from said second flux of light.
Claim 10
Dependent Claim
51 words
An imprint lithography template, said template comprising: template alignment marks, with said template substantially transparent to a first flux of light and said template alignment marks producing an analyzable mark in response to a second flux of light with said first flux of light differing from said second flux of light.
Claim 11
Dependent Claim
17 words
The template as recited in claim 8 , wherein said first flux of light includes ultraviolet light.
Claim 12
Dependent Claim
17 words
The template as recited in claim 8 , wherein said second flux of light includes visible light.
Claim 13
Dependent Claim
21 words
The template as recited in claim 8 , wherein said template alignment marks comprise SiO x with x less than 2.
Claim 14
Dependent Claim
20 words
The template as recited in claim 8 , wherein said template alignment marks comprise SiO x with x approximately 1.5.
Claim 15
Dependent Claim
20 words
The template as recited in claim 8 , wherein said template is substantially transparent to said second flux of light.
Claim 16
Dependent Claim
22 words
The template as recited in claim 8 , wherein said template alignment marks are substantially transparent to said first flux of light.
Claim 17
Dependent Claim
28 words
An imprint lithography template, said template comprising: template alignment marks that are substantially transparent to ultraviolet light and that produce an analyzable mark in response to visible light.
Claim 18
Dependent Claim
28 words
An imprint lithography template, said template comprising: template alignment marks that are substantially transparent to ultraviolet light and that produce an analyzable mark in response to visible light.
Claim 19
Dependent Claim
21 words
The template as recited in claim 15 , wherein said template alignment marks comprise SiO x with x less than 2.
Claim 20
Dependent Claim
20 words
The template as recited in claim 15 , wherein said template alignment marks comprise SiO x with x approximately 1.5.
Claim 21
Dependent Claim
20 words
The template as recited in claim 15 , wherein said template is substantially transparent to said first flux of light.
Claim 22
Dependent Claim
20 words
The template as recited in claim 15 , wherein said template is substantially transparent to said second flux of light.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2008-01-11 | 2008-07-12 | 2009-01-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2012-01-11 | 2012-07-12 | 2013-01-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2016-01-11 | 2016-07-12 | 2017-01-11 | $7700.00 | Window Closed / Lapsed |